Optimization of plasma-enhanced chemical vapor deposition of hydrogenated amorphous silicon

Journal of Applied Physics

Volumn 83, Issue 12, 1998, Pages 8002-8009

  Oversluizen, G ^a   Lodders, W H M ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0003324876     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.367892     Document Type: Article

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