Mechanical stress reduction in PECVD a-Si:H thin films

Materials Science and Engineering B: Solid-State Materials for Advanced Technology

Volumn 65, Issue 2, 1999, Pages 123-126

  Alzar, C L Garrido ^a  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; HYDROGENATION; MATHEMATICAL MODELS; MOLECULAR DYNAMICS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; STRESS ANALYSIS;

ATOMIC CLUSTER INTERACTION; STRESS REDUCTION;

AMORPHOUS FILMS;

EID: 0033570525     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(99)00222-6     Document Type: Article

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