Fabrication of thin film silicon solar cells on plastic substrate by very high frequency PECVD

Solar Energy Materials and Solar Cells

Volumn 94, Issue 9, 2010, Pages 1534-1541

  Rath, J K ^a   Brinza, M ^a   Liu, Y ^a   Borreman, A ^b   Schropp, R E I ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

^b Helianthos Bv A Nuon Company   (Netherlands)

Author keywords

Amorphous silicon; Nanocrystalline silicon; Plastic; Solar cell; Thin film; VHF PECVD

Indexed keywords

CELL PROCESSING; CELL TRANSFER; DEPOSITION CONDITIONS; DIRECT DEPOSITION; ELECTRODE DISTANCES; FABRICATION OF THIN FILMS; FLEXIBLE SUBSTRATE; GASPHASE; HIGH EFFICIENCY; HIGH SUBSTRATE TEMPERATURE; HYDROGEN DILUTION; IN-SITU; ION ENERGIES; LOW SUBSTRATE TEMPERATURE; LOW TEMPERATURES; MATERIAL QUALITY; PLASTIC SOLAR CELLS; PLASTIC SUBSTRATES; PROCESS PARAMETERS; SUBSTRATE TEMPERATURE; TANDEM CELLS; TEMPERATURE SENSITIVE SUBSTRATES; THIN FILM SILICON; THIN-FILM SILICON SOLAR CELLS; TRANSFER PROCESS; VERY HIGH FREQUENCY PECVD; VHF-PECVD;

AMORPHOUS FILMS; AMORPHOUS SILICON; CELLS; DEPOSITION; NANOCRYSTALLINE SILICON; PLASTICS; POLYETHYLENE TEREPHTHALATES; SEMICONDUCTING SILICON COMPOUNDS; SILICON SOLAR CELLS; SOLAR CELLS; THIN FILMS; VAPOR DEPOSITION;

SUBSTRATES;

EID: 77955419752     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2010.01.013     Document Type: Conference Paper

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