Amorphous silicon solar cells deposited at high growth rate

Journal of Non-Crystalline Solids

Volumn 299-302, Issue PART 2, 2002, Pages 1116-1122

  Nishimoto, Tomonori ^a   Takai, Madoka ^b   Miyahara, Hiroomi ^c   Kondo, Michio ^c   Matsuda, Akihisa ^c  

^a CANON INC   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

^c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; EMISSION SPECTROSCOPY; HYDROGEN BONDS; MASS SPECTROMETRY; PLASMA DIAGNOSTICS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RATE CONSTANTS; THIN FILMS;

FILM STABILITY;

SILICON SOLAR CELLS;

EID: 0036532144     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(02)00942-0     Document Type: Article

References (13)