Deposition of amorphous silicon films by hot-wire chemical vapor deposition

Journal of Applied Physics

Volumn 85, Issue 9, 1999, Pages 6843-6852

  Feenstra, K F ^a   Schropp, R E I ^a   Van Der Weg, W F ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; COMPRESSIVE STRESS; FILM GROWTH; MICROSTRUCTURE; PRESSURE EFFECTS; REFRACTIVE INDEX; SUBSTRATES; THERMAL EFFECTS;

HOT-WIRE CHEMICAL VAPOR DEPOSITION (HWCVD);

AMORPHOUS FILMS;

EID: 0032613381     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.370202     Document Type: Article

References (28)

1. H. Wiesmann, A. K. Gosh, T. McMahon, and M. Strongin, J. Appl. Phys. 50, 3752 (1979).
2. H. Matsumura, J. Appl. Phys. 65, 4396 (1989).
3. A. H. Mahan, J. Carapella, B. P. Nelson, R. S. Crandall, and I. Balberg, J. Appl. Phys. 69, 6728 (1991).
4. W. B. Jackson and J. Kakalios, in Amorphous Silicon and Related Materials, edited by H. Pritsche (World Scientific, Singapore, 1988), p. 247.
5. T. Haage, S. Bauer, B. Schröder, and H. Oechsner, Conference Proceedings of the 1st World Conference on Photovoltaic Energy Conversion, Waikoloa, Hawaii, 1994, p. 429.
6. J. Doyle, R. Robertson, G. H. Lin, M. Z. He, and A. Gallagher, J. Appl. Phys. 64, 3215 (1988).
7. E. C. Molenbroek, A. H. Mahan, and A. Gallagher, J. Appl. Phys. 82, 1909 (1997).
8. A. H. Mahan, D. L. Williamson, and T. E. Furtak, Mater. Res. Soc. Symp. Proc. 467, 657 (1997).
9. R. Zedlitz, F. Kessler, and M. Heintze, J. Non-Cryst. Solids 164-166, 83 (1993).
10. J. P. Conde, P. Brogueira, and V. Chu, Philos. Mag. B 76, 299 (1997).
11. C. Horbach, W. Beyer, and H. Wagner, J. Non-Cryst. Solids 137&138, 661 (1991).
12. M. H. Brodsky, M. Cardona, and J. J. Cuomo, Phys. Rev. B 16, 3556 (1977).
13. A. A. Langford, M. L. Fleet, B. P. Nelson, W. A. Lanford, and N. Maley, Phys. Rev. B 45, 13367 (1992).
14. D. Ritter, E. Zeldov, and K. Weiser, Appl. Phys. Lett. 49, 791 (1986).
15. E. A. G. Hamers (private communication).
16. J. Perrin, O. Leroy, and M. C. Brodage, Contrib. Plasma Phys. 36, 3 (1996).
17. M. J. Kushner, J. Appl. Phys. 63, 2532 (1988).
18. V. L. Dalal, T. Maxson, K. Han, and S. Haroon, J. Non-Cryst. Solids 227-230, 1257 (1998).
19. S. Acco, Ph.D. thesis, Utrecht University, 1997.
20. X. Liu, Mater. Res. Soc. Symp. Proc. 507, 595 (1998).
21. S. Bauer, B. Schröder, and H. Oechsner, J. Non-Cryst. Solids 227-230, 34 (1998).
22. H. Meiling, Ph.D. thesis, Utrecht University, 1991.
23. R. S. Crandall, X. Liu, and E. Iwaniczko, J. Non-Cryst. Solids 227-230, 23 (1998).
24. A. H. Mahan, Y. Chen, D. L. Williamson, and G. D. Mooney, J. Non-Cryst. Solids 137&138, 65 (1991).
25. Y. Wu, J. T. Stephen, D. X. Han, J. M. Rutland, R. S. Crandall, and A. H. Mahan, Phys. Rev. Lett. 77, 2049 (1996).
26. A. J. M. Berntsen, Ph.D. thesis, Utrecht University, 1993.
27. K. F. Feenstra, P. F. A. Alkemade, E. Algra, R. E. I. Schropp, and W. F. van der Weg, Progress in Photovoltaics (to be published).
28. W. Beyer and U. Zastrow, Mater. Res. Soc. Symp. Proc. 420, 497 (1996).