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Volumn 2, Issue , 2006, Pages 1724-1727

Production equipment for large area deposition of amorphous and microcrystalline silicon thin-film solar cells

Author keywords

[No Author keywords available]

Indexed keywords

MICROCRYSTALLINE SILICON; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILM DEVICES;

EID: 41749098803     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/WCPEC.2006.279824     Document Type: Conference Paper
Times cited : (6)

References (16)
  • 3
    • 41749090676 scopus 로고    scopus 로고
    • EPIA press release from 09/01
    • EPIA press release from 09/01/2006, www.epia.org.
    • (2006)
  • 9
  • 15
    • 20744459770 scopus 로고    scopus 로고
    • see also Y. Mai, S. Klein, R. Carius, J. Wolff, A. Lambertz, F. Finger and X. Geng, heJ. Appl. Phys. 97, 2005, pp. 114913.
    • see also Y. Mai, S. Klein, R. Carius, J. Wolff, A. Lambertz, F. Finger and X. Geng, heJ. Appl. Phys. 97, 2005, pp. 114913.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.