Highly stable a-Si:H films deposited by using multi-hollow plasma chemical vapor deposition

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 44, Issue 46-49, 2005, Pages

  Koga, Kazunori ^a   Indue, Toshihisa ^a   Bando, Kouki ^a   Iwashita, Shinya ^a   Shiratani, Masaharu ^a   Watanabe, Yukio ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

Clusters; Defect density; Hydrogenated amorphous silicon films; Light induced degradation; Plasma CVD; Staebler Wronski effects

Indexed keywords

CVD REACTORS; DEFECT DENSITY; LIGHT EXPOSURE;

AMORPHOUS SILICON; FILM GROWTH; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

SILANES;

EID: 31944440958     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.L1430     Document Type: Article

References (11)

1. D. L. Staebler and C. R. Wronski: Appl. Phys. Lett. 31 (1977) 292.
2. R. E. I. Schropp and M. Zeman: Amorphous and Macrocrystalline Silicon Solar Cells (Kluwer Academic Publishers, Boston, 1998) p. 99.
3. K. Koga, Y. Matsuoka. K. Tanaka, M. Shiratani and Y. Watanabe: Appl. Phys. Lett. 77 (2000) 196.
4. K. Koga, N. Kaguchi, M. Shiratani and Y. Watanabe: J. Vac. Sci. Technol. A 22 (2004) 1536.
5. C. Longeaud, J. P. Kleider, P. Roca i Cabarrocas, S. Hamma, R. Meaudre and M. Meaudre: J. Non-Cryst. Solids 227-230 (1998) 96.
6. Y. Poissant, P. Chatterjee and P. Roca i Cabarrocas: J. Non-Cryst. Solids 299-302 (2002) 1173.
7. T. Nishimoto, M. Takai, H. Miyahara, M. Kondo and A. Matsuda: J. Non-Cryst. Solids 299 (2002) 1116.
8. K. Koga, M. Kai, M. Shiratani, Y. Watanabe and N. Shikatani: Jpn. J. Appl. Phys. 41 (2002) LI68.
9. K. Koga, N. Kaguchi, K. Bando, M. Shiratani and Y. Watanabe: Rev. Sci. Instrum. 76 (2005) 113501.
10. M. Shiratani, S. Maeda, K. Koga and Y. Watanabe: Jpn. J. Appl. Phys. 39 (2000) 287.
11. M. H. Brodsky, M. Cardona and J. J. Cuomo: Phys. Rev. B 16 (1977) 3556.