Highly stabilized hydrogenated amorphous silicon solar cells fabricated by triode-plasma CVD

Thin Solid Films

Volumn 502, Issue 1-2, 2006, Pages 306-310

  Sonobe, H ^a   Sato, A ^b   Shimizu, S ^b   Matsui, T ^b   Kondo, M ^b   Matsuda, A ^b  

^a MITSUBISHI HEAVY INDUSTRIES LTD   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Chemical vapor deposition (CVD); Plasma processing and deposition; Silicon; Solar cells

Indexed keywords

AMORPHOUS SILICON; HYDROGENATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; STABILIZATION;

BOND DENSITY; PLASMA PROCESSING AND DEPOSITION;

SOLAR CELLS;

EID: 33644505480     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.300     Document Type: Conference Paper

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