World's largest amorphous silicon photovoltaic module

Thin Solid Films

Volumn 506-507, Issue , 2006, Pages 13-16

  Takatsuka, Hiromu ^a   Yamauchi, Yasuhiro ^a   Kawamura, Keisuke ^a   Mashima, Hiroshi ^a   Takeuchi, Yoshiaki ^a  

^a MITSUBISHI HEAVY INDUSTRIES LTD   (Japan)

Author keywords

a Si; Ladder shaped electrode; PECVD; Solar cell; VHF plasma

Indexed keywords

AMORPHOUS SILICON; COST BENEFIT ANALYSIS; DEPOSITION; GLASS; PLASMA APPLICATIONS; SOLAR CELLS; THIN FILMS;

LADDER-SHAPED ELECTRODES; PECVD; VHF PLASMA;

PHOTOVOLTAIC CELLS;

EID: 33645281132     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.08.011     Document Type: Conference Paper

References (12)

1. H. Curtins, N. Wyrsch, M. Favre, and A. Shah Plasma Chem. Plasma Process. 7 1987 267
2. S. Oda, J. Noda, and M. Matsumura Jpn. J. Appl. Phys. 29 1990 1889
3. M. Heintze, R. Zedlitz, and G.H. Bauer J. Phys. D : Appl. Phys. 26 1993 1781
4. U. Kroll, A. Shah, H. Keppner, J. Meier, P. Torres, and D. Fischer Sol. Energy Mater. Sol. Cells 48 1997 343
5. A.A. Howling, J.-L. Dorier, U. Ch. Hollenstein, and F. Kroll J. Vac. Sci. Technol., A 10 1992 1080
6. L. Sansonnens, A. Pletzer, D. Magni, A.A. Howling, Ch. Hollenstein, and J.P.M. Schmitt Plasma Sources Sci. Technol. 6 1997 170
7. M.A. Lieberman, J.P. Booth, P. Chabert, J.M. Rax, and M.M. Turner Plasma Sources Sci. Technol. 11 2002 283
8. M. Murata, Y. Takeuchi, and S. Nishida Vacuum 48 1997 34
9. Y. Takeuchi, Y. Nawata, K. Ogawa, A. Serizawa, Y. Yamauchi, and M. Murata Thin Solid Films 386 2001 133
10. N. Nakamura, T. Takahama, M. Isomura, M. Nishikuni, K. Yoshida, and K. Kuwano Jpn. J. Appl. Phys. 28 1989 1762
11. K. Koga, M. Kai, M. Shiratani, Y. Watanabe, and N. Shikatani Jpn. J. Appl. Phys. 41 2002 L168
12. T. Nishimoto, M. Takai, H. Miyahara, M. Kondo, and A. Matsuda J. Non-Cryst. Solids 299-302 2002 1116