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Volumn 288, Issue 1-2, 1996, Pages 337-345

Substrate temperature dependent photoelectrical and structural properties of a-Si:H deposited by hydrogen assisted chemical vapour deposition

Author keywords

a si:H; Chemical vapour deposition; Photoelectrical properties; Structural properties

Indexed keywords

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; CRYSTAL DEFECTS; CRYSTAL MICROSTRUCTURE; DENSITY MEASUREMENT (OPTICAL); HIGH TEMPERATURE EFFECTS; HYDROGENATION; INFRARED SPECTROSCOPY; PHOTOCONDUCTIVITY; SUBSTRATES;

EID: 0030284925     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)08852-9     Document Type: Article
Times cited : (6)

References (45)
  • 18
  • 29
    • 0042324392 scopus 로고
    • private communication, University of Frankfurt
    • A. Herbert, private communication, University of Frankfurt (1995).
    • (1995)
    • Herbert, A.1
  • 41
  • 42
    • 0000063045 scopus 로고
    • R.A. Street, Phys. Rev. B, 43 (1991) 2454; 44 (1991) 10610.
    • (1991) Phys. Rev. B , vol.44 , pp. 10610


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.