Development of high efficiency large area silicon thin film modules using VHF-PECVD

Solar Energy

Volumn 77, Issue 6, 2004, Pages 951-960

  Takatsuka, Hiromu ^a   Noda, Matsuhei ^a   Yonekura, Yoshimichi ^a   Takeuchi, Yoshiaki ^a   Yamauchi, Yasuhiro ^a  

^a MITSUBISHI HEAVY INDUSTRIES LTD   (Japan)

Author keywords

Amorphous silicon; High deposition rate; Large area deposition; Microcrystalline silicon; PECVD; Solar cell; Tandem cell; VHF

Indexed keywords

COST EFFECTIVENESS; DEPOSITION; PRODUCTIVITY; SILICON;

PRODUCTION TECHNOLOGY; SOLAR MODULES;

THIN FILMS;

PHOTOVOLTAIC SYSTEM;

EID: 10044257657     PISSN: 0038092X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solener.2004.06.007     Document Type: Article

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