High resolution UV roll-to-roll nanoimprinting of resin moulds and subsequent replication via thermal nanoimprint lithography

Nanotechnology

Volumn 23, Issue 48, 2012, Pages

  Dumond, Jarrett J ^a,b   Mahabadi, Kambiz Ansari ^b   Yee, Yew Sok ^b   Tan, Christina ^b   Fuh, Jerry Ying Hsi ^a   Lee, Heow Pueh ^a   Low, Hong Yee ^b  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

BATCH MODES; DATA STORAGE; ENABLING TECHNOLOGIES; HIGH RESOLUTION; HIGH THROUGHPUT; LOW COSTS; MASS PRODUCTION; NANO SCALE; NANO-IMPRINTING; NANO-IMPRINTING PROCESS; NANOSCALE FEATURES; NANOSCALE LITHOGRAPHY; PRODUCTION COST; ROLL TO ROLL; ROLL-TO-ROLL FABRICATION; SILICON SUBSTRATES; THERMAL NANOIMPRINT LITHOGRAPHY; VOLUMETRIC SHRINKAGE;

MOLDS; NANOTECHNOLOGY; RESINS;

NANOIMPRINT LITHOGRAPHY;

EID: 84869039611     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/23/48/485310     Document Type: Article

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