SCOPUS 정보 검색 플랫폼

Microelectronic Engineering

Volumn 87, Issue 2, 2010, Pages 122-124

XPS study of the degradation mechanism of fluorinated anti-sticking treatments used in UV nanoimprint lithography

(6) Truffier Boutry, D a Beaurain, A a Galand, R a Pelissier, B a Boussey, J a Zelsmann, M a

a CEA LETI (France)

Author keywords

Anti sticking layer; Fluorinated treatments; Nanoimprint lithography; XPS

Indexed keywords

ANTI-STICKING LAYER; ANTISTICKING LAYERS; DEGRADATION MECHANISM; EXPERIMENTAL PROTOCOLS; FLUORINATED MOLECULES; LOW SURFACE ENERGY; RELEASE PROPERTY; UV NANOIMPRINT LITHOGRAPHY; X-RAY EXPOSURE; XPS;

DEGRADATION; PHOTODEGRADATION; SURFACE CHEMISTRY; SURFACE TENSION; X RAY PHOTOELECTRON SPECTROSCOPY;

NANOIMPRINT LITHOGRAPHY;

EID: 70450267558 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/j.mee.2009.06.004 Document Type: Article

Times cited : (40)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.