Chemical degradation of fluorinated antisticking treatments in UV nanoimprint lithography

Applied Physics Letters

Volumn 94, Issue 4, 2009, Pages

  Truffier Boutry, D ^a   Zelsmann, M ^a   De Girolamo, J ^a   Boussey, J ^a   Lombard, C ^b   Ppin Donat B ^b  

^a CEA LETI   (France)

^b CEA GRENOBLE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTIONS; CHEMICAL REACTIVITY; DEGRADATION; ELECTROSLAG REMELTING; FREE RADICAL REACTIONS; FREE RADICALS; SPIN DYNAMICS;

ANTI-STICKING LAYERS; CHEMICAL DEGRADATIONS; ELECTRON SPIN RESONANCES; FLUORINATED MOLECULES; MOLD SURFACES; UV ILLUMINATIONS; UV-CURABLE; UV-NANOIMPRINT LITHOGRAPHIES;

NANOIMPRINT LITHOGRAPHY;

EID: 59349091479     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3077172     Document Type: Article

References (8)

1. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.114851 67, 3114 (1995).
2. J. Haisma, M. Verheijein, K. van den Heuvel, and J. van den Berg, J. Vac. Sci. Technol. B JVTBD9 1071-1023 10.1116/1.588604 14, 4124 (1996).
3. H. Schift, J. Vac. Sci. Technol. B JVTBD9 1071-1023 10.1116/1.2890972 26, 458 (2008).
4. Y. Tada, H. Yoshida, and A. Miyauchi, J. Photopolym. Sci. Technol. 20, 545 (2007). 0914-9244
5. F. A. Houle, E. Guyer, D. C. Miller, and R. Dauskardt, J. Vac. Sci. Technol. B JVTBD9 1071-1023 10.1116/1.2746336 25, 1179 (2007).
6. S. Garidel, M. Zelsmann, N. Chaix, P. Voisin, J. Boussey, A. Beaurain, and B. Pelissier, J. Vac. Sci. Technol. B JVTBD9 1071-1023 10.1116/1.2806969 25, 2430 (2007).
7. D. Truffier-Boutry, Physico-chemical study of methacrylated resists used in dental composites, Ph.D. thesis, Universit́ Catholique Louvain (2005).
8. X. Gao and J. Nie, Polym. Int. 56, 707 (2007). 0959-8103