UV-curable resins appropriate for UV nanoimprint

Journal of Photopolymer Science and Technology

Volumn 21, Issue 4, 2008, Pages 573-581

  Iyoshi, Shuso ^a   Miyake, Hiroto ^a   Nakamatsu, Ken Ichiro ^b   Matsui, Shinji ^b  

^a DAICEL CORPORATION   (Japan)

^b UNIVERSITY OF HYOGO   (Japan)

Author keywords

Acrylic material; Cation; Epoxide; Radical; UV curable resin; UV nanoimprint

Indexed keywords

EID: 50849106739     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.21.573     Document Type: Article

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