Cross-linked polymer replica of a nanoimprint mold at 30 nm half-pitch

Nano Letters

Volumn 5, Issue 1, 2005, Pages 179-182

  Ge, Haixiong ^b   Wu, Wei ^a   Li, Zhiyong ^a   Jung, Gun Young ^a   Olynick, Deirdre ^c   Chen, Yanfeng ^b   Liddle, J Alexander ^c   Wang, Shih Yuan ^a   Williams, R Stanley ^a  

^a HEWLETT PACKARD LABORATORIES   (United States)

^b NANJING UNIVERSITY   (China)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FLUOROALKYLSILANES; INTERFERENCE LITHOGRAPHY; NANOIMPRINT LITHOGRAPHY; PHOTOCURABLE MATERIALS;

CROSSLINKING; LITHOGRAPHY; MOLDS; NANOTECHNOLOGY; PHOTOLITHOGRAPHY; SUBSTRATES; THIN FILMS; VISCOSITY;

POLYMERS;

EID: 12844275924     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl048618k     Document Type: Article

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