Effects of environmental gas in UV nanoimprint on the characteristics of UV-curable resin

Japanese Journal of Applied Physics

Volumn 49, Issue 6 PART 2, 2010, Pages

  Wang, Qing ^a,b   Hiroshima, Hiroshi ^a,b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMBIENT GAS; PATTERN TRANSFERS; PENTAFLUOROPROPANE; RESIDUAL LAYER THICKNESS; RESIDUAL LAYERS; UV CURABLE; UV EXPOSURE; UV-NANOIMPRINT;

CURING; SHRINKAGE;

RESINS;

EID: 77955319015     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.49.06GL04     Document Type: Article

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