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Journal of Photopolymer Science and Technology

Volumn 23, Issue 6, 2010, Pages 781-787

Preparation of replicated resin mold for UV nanoimprint using reworkable dimethacrylate

(3) Matsukawa, Daisaku a Okamura, Haruyuki a Shirai, Masamitsu a

a Osaka Prefecture University (Japan)

Author keywords

Hemiacetal ester; Replica mold; Reworkable resin; UV imprint

Indexed keywords

EID: 78650940531 PISSN: 09149244 EISSN: 13496336 Source Type: Journal
DOI: 10.2494/photopolymer.23.781 Document Type: Article

Times cited : (13)

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