Roll-to-roll UV imprint for bottom-up transistor fabrication

Journal of Photopolymer Science and Technology

Volumn 24, Issue 1, 2011, Pages 43-45

  Maury, P ^a   Turkenburg, D ^b   Stroeks, N ^b   Giesen, Peter ^b   Wijnen, M ^b   Tacken, R ^c   Meinders, E ^b   van der Werf, R ^a  

^a ASML   (Netherlands)

^b HOLST CENTRE   (Netherlands)

^c Singulus Mastering ^*  (Netherlands)

Author keywords

Bottom up transistor; Nanoimprint; R2R imprint; Self alignment

Indexed keywords

EID: 79961132863     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.24.43     Document Type: Article

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