Novel resist for replica preparation of mold for imprint lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7273, Issue , 2009, Pages

  Matsukawa, Daisaku ^a   Wakayama, Hiroyuki ^a   Mitsukura, Kazuyuki ^a   Okamura, Haruyuki ^a   Hirai, Yoshihiko ^a   Shirai, Masamitsu ^a  

^a Osaka Prefecture University   (Japan)

Author keywords

Hemiacetal ester; Methacrylate; Replica preparation; Reworkable resin; UV imprint

Indexed keywords

HEMIACETAL ESTER; METHACRYLATE; REPLICA PREPARATION; REWORKABLE RESIN; UV IMPRINT;

ACIDS; CURING; ESTERIFICATION; ESTERS; ETHERS; METHANOL; MOLDS; PHOTODEGRADATION; POLYACRYLATES; RESINS; SHRINKAGE; SUGAR (SUCROSE);

NANOIMPRINT LITHOGRAPHY;

EID: 65849425149     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.813383     Document Type: Conference Paper

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