Fabrication of a seamless roll mold by direct writing with an electron beam on a rotating cylindrical substrate

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages 2841-2845

  Taniguchi, Jun ^a   Aratani, Masao ^a  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANGLE OF INCIDENCE; COATING METHODS; CYLINDRICAL SHAPES; CYLINDRICAL SUBSTRATE; DIRECT WRITING; NANO-SCALE PATTERNS; RESIST LAYERS; RESIST MATERIALS; ROTATING EQUIPMENT; SECONDARY ELECTRONS; SUBMICRON; ULTRAVIOLET-NANOIMPRINT LITHOGRAPHY; UNIFORM LAYER;

ELECTRON BEAMS; ESTERS; MOLDS; OPTICAL MATERIALS; ROTATION;

SUBSTRATES;

EID: 72849148575     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3237141     Document Type: Conference Paper

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