UV nanoimprint in pentafluoropropane at a minimal imprint pressure

Japanese Journal of Applied Physics

Volumn 49, Issue 6 PART 2, 2010, Pages

  Hiroshima, Hiroshi ^a,b   Atobe, Hidemasa ^a,b   Wang, Qing ^a,b   Youn, Sung Won ^a,b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BUBBLE DEFECTS; CAPILLARY FORCE; FRACTAL STRUCTURES; INITIAL STAGES; PENTAFLUOROPROPANE; REAL TIME MONITORING; UV-NANOIMPRINT;

DEFECTS; MOLDS; RESINS;

FILLING;

EID: 77955331609     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.49.06GL01     Document Type: Article

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