Approaches to rapid resist spreading on dispensing based UV-NIL

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7970, Issue , 2011, Pages

  Usuki, Kazuyuki ^a   Wakamatsu, Satoshi ^a   Oomatsu, Tadashi ^a   Kodama, Kenichi ^a   Kodama, Kunihiko ^a  

^a FUJIFILM CORPORATION   (Japan)

Author keywords

Imprint; Ink jet; Resist; UV NIL

Indexed keywords

AIR ATMOSPHERE; AIR BUBBLES; AREA DENSITY; BRIDGE FORMATION; DISSOLUTION SPEED; DISSOLUTION TIME; DROPLET SIZES; FILLING PROCESS; IMPRINT; IN-VACUUM; INK-JET; LOW VISCOSITY; RESIST; UV-NANOIMPRINT LITHOGRAPHY; UV-NIL;

DISSOLUTION; DROPS; FILLING; HELIUM; INK;

NANOIMPRINT LITHOGRAPHY;

EID: 79955879669     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.879200     Document Type: Conference Paper

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