Control of bubble defects in UV nanoimprint

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 9 B, 2007, Pages 6391-6394

  Hiroshima, Hiroshi ^a   Komuro, Masanori ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Bubble defects; Dissolution; Gas condensation; Imprint lithography; Pentafluoropropane; Resin squeezing; Trichlorofluoromethane; UV nanoimprint; Vacuumless

Indexed keywords

BUBBLES (IN FLUIDS); DISSOLUTION; RESINS;

BUBBLE DEFECTS; GAS CONDENSATION; IMPRINT LITHOGRAPHY; PENTAFLUOROPROPANE; RESIN SQUEEZING; TRICHLOROFLUOROMETHANE; UV NANOIMPRINT;

NANOIMPRINT LITHOGRAPHY;

BUBBLES; DISSOLVING; LITHOGRAPHY;

EID: 34648815904     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.6391     Document Type: Article

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