High-resolution functional epoxysilsesquioxane-based patterning layers for large-area nanoimprinting

ACS Nano

Volumn 4, Issue 8, 2010, Pages 4776-4784

  Pina Hernandez, Carlos ^a   Guo, L Jay ^a   Fu, Peng Fei ^b  

^a UNIVERSITY OF MICHIGAN   (United States)

^b DOW CORNING CORPORATION   (United States)

Author keywords

Flexible substrate; Nanoimprint lithography; Patterning; Roll to roll

Indexed keywords

DRY-ETCH; FLEXIBLE SUBSTRATE; FLUOROALKYL GROUP; HIGH RESOLUTION; NANO-IMPRINTING; PATTERNING; PATTERNING LAYERS; ROLL TO ROLL; ROOM TEMPERATURE; SILSESQUIOXANES; UV EXPOSURE;

CMOS INTEGRATED CIRCUITS; FLIGHT DYNAMICS; FUNCTIONAL GROUPS; FUNCTIONAL POLYMERS; MOLDS; RESINS;

NANOIMPRINT LITHOGRAPHY;

EID: 78650113574     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn100478a     Document Type: Article

References (50)

1. Roger, J. A., Lee, H. H., Eds. Unconventional Nanopatterning Techniques and Applications; Wiley: New York, 2008.
2. (a) Chou, S. Y.; Krauss, P. R.; Renstrom, P. J. Imprint Lithography with 25-Nanometer Resolution. Science 1996, 272, 85-87.
3. (b) Chou, S. Y.; Krauss, P. R.; Renstrom, P. J. Imprint of Sub-25 nm Vias and Trenches in Polymers. Appl. Phys. Lett. 1995, 67, 3114-3136.
4. Guo, L. J. Nanoimprint Lithography: Methods and Material Requirements. Adv. Mater. 2007, 19, 495-513.
5. Ahn, S. W.; Lee, K. D.; Kim, J. S.; Kim, S. H.; Park, J. D.; Lee, S. H.; Yoon, P. W. Fabrication of a 50 nm Half-Pitch Wire Grid Polarizer Using Nanoimprint Lithography. Nanotechnology 2005, 16, 1874-1877.
6. Ekinci, Y.; Solak, H. H.; David, C.; Sigg, H. Bilayer Al Wire-Grids as Broadband and High-Performance Polarizers. Opt. Express 2006, 14, 2323-2334.
7. Cheng, X.; Hong, Y. T.; Kanicki, J.; Guo, L. J. High-Resolution Organic Polymer Light-Emitting Pixels Fabricated by Imprinting Technique. J. Vac. Sci. Technol., B 2002, 20, 2877-2880.
8. Kao, P. C.; Chu, S. Y.; Chen, T. Y.; Zhan, C. Y.; Hong, F. C.; Chang, C. Y.; Hsu, L. C.; Liao, W.; Hon, M. H. Fabrication of Large-Scaled Organic Light Emitting Devices on the Flexible Substrates Using Low-Pressure Imprinting Lithography. IEEE Trans. Electron Devices 2005, 52, 1722-1726.
9. Wang, J.; Kostal, H. Diffractive Optics-Nanoimprint Lithography Enables Fabrication of Subwavelength Optics. Laser Focus World 2005, 41, 76.
10. McClelland, G. M.; Hart, M. W.; Rettner, C. T.; Best, M. E.; Carter, K. R.; Terris, B. D. Nanoscale Patterning of Magnetic Islands by Imprint Lithography Using a Flexible Mold. Appl. Phys. Lett. 2002, 81, 1483-1485.
11. Moritz, J.; Buda, L.; Dieny, B.; Nozieres, J. P.; van de Veerdonk, R. J. M.; Crawford, T. M.; Weller, D. Writing and Reading Bits on Pre-Patterned Media. Appl. Phys. Lett. 2004, 84, 1519-1521.
12. Martensson, T.; Carlberg, P.; Borgstrom, M.; Montelius, L.; Seifert, W.; Samuelson, L. Nanowire Arrays Defined by Nanoimprint Lithography. Nano Lett. 2004, 4, 699-702.
13. Guo, L. J.; Cheng, X.; Chou, C. F. Fabrication of Size-Controllable Nanofluidic Channels by Nanoimprinting and Its Application for DNA Stretching. Nano Lett. 2004, 4, 69-73.
14. Falconnet, D.; Pasqui, D.; Park, D.; Eckert, R.; Schift, H.; Gobrecht, J.; Barbucci, R.; Textor, M. A Novel Approach To Produce Protein Nanopatterns by Combining Nanoimprint Lithography and Molecular Self-Assembly. Nano Lett. 2004, 4, 1909-1914.
15. Hoff, J. D.; Cheng, L. J.; Meyhofer, E.; Guo, L. J.; Hunt, A. J. Nanoscale Protein Patterning by Imprint Lithography. Nano Lett. 2004, 4, 853-857.
16. http://www.itrs.net/reports.html.
17. Colburn, M. E. Ph.D. Dissertation, University of Texas at Austin, 2001.
18. Kim, E. K.; Stacey, N. A.; Smith, B. J.; Dickey, M. D.; Johnson, S. C.; Trinque, B. C.; Willson, C. G. Vinyl Ethers in Ultraviolet Curable Formulations for Step and Flash Imprint Lithography. J. Vac. Sci. Technol., B 2004, 22, 131-135.
19. Hagberg, E. C.; Malkoch, M.; Ling, Y.; Hawker, C. J.; Carter, K. R. Effects of Modulus and Surface Chemistry of Thiolene Photopolymers in Nanoimprinting. Nano Lett. 2007, 7, 233-237.
20. Cheng, X.; Guo, L. J.; Fu, P. F. Room-Temperature, Low-Pressure Nanoimprinting Based on Cationic Photopolymerization of Novel Epoxysilicone Monomers. Adv. Mater. 2005, 17, 1419-1424.
21. Baney, R. H.; Itoh, M.; Sakakibara, A.; Suzuki, T. Silsesquioxanes. Chem. Rev. 1995, 95, 1409-1430.
22. Crivello, J. V.; Jang, M. Synthesis of Novel Silicon-Containing Monomers for Photoinitiated Cationic Polymerization. ACS Symposium Series Science and Technology of Silicones and Silicones-Modified Materials, 2007; Vol. 964, pp 27-36.
23. Song, K. Y.; Crivello, J. V.; Ghoshal, R. Synthesis and Photoinitiated Cationic Polymerization of Organic-Inorganic Hybrid. Chem. Mater. 2001, 13,1932-1942.
24. Crivello, J. V.; Lee, J. L. The UV Cure of Epoxy Silicone Monomers. Abstracts of Papers 1989, 60, 197. 48-PMSE.
25. Stewart, M. D.; Wetzel, J. T.; Schmid, G. M.; Palmieri, F.; Thompson, E.; Kim, E. K.; Wang, D.; Sotodeh, K.; Jen, K.; Johnson, S. C.; Hao, J.; Dickey, M. D.; Nishimura, Y.; Laine, R. M.; Resnick, D. J.; Willson, C. G. Direct Imprinting of Dielectric Materials for Dual Damascene Processing. Proc. SPIE 2005, 5751, 210-218.
26. Seung, J. C.; Kim, G.; Laine, R. M. Organic/Inorganic Hybrid Epoxy Nanocomposites from Aminophenylsilsesquioxanes. Macromolecules 2004, 37, 99-109.
27. Crivello, J. V.; Malik, R. J. Synthesis and Photoinitiated Cationic Polymerization of Monomers with the Silsesquioxane Core. Polym. Sci., Polym. Chem. Ed. 1997, 35, 407-425.
28. Crivello, J. V.; Mao, Z. Preparation and Cationic Photopolymerization of Organic-Inorganic Hybrid Matrixes. Chem. Mater. 1997, 9, 1562-1569.
29. Ro, H. W.; Jones, R. L.; Peng, H.; Hines, D. R.; Lee, H. J.; Lin, E. K.; Karim, A.; Yoon, D. Y.; Gidley, D. W.; Soles, C. L. The Direct Patterning of Nanoporous Interlayer Dielectric Insulator Films by Nanoimprint Lithography. Adv. Mater. 2007, 19, 2919-2924. (Pubitemid 47597888)
30. Palmieri, F.; Stewart, M. D; Wetzel, J.; Hao, J.; Nishimura, Y.; Jen, K.; Flannery, C.; Li, B.; Chao, H. L.; Young, S.; Kim, W. C.; Ho, P. S.; Willson, C. G. Multi-level Step and Flash Imprint Lithography for Direct Patterning of Dielectrics. Proc. SPIE 2006, 6751, 61510J.
31. De Girolamo, J.; Chouiki, C.; Tortai, J. H.; Sourd, C.; Derrough, S.; Zelsmann, M.; Boussey, J. Epoxy Silsesquioxane Resists for UV Nanoimprint Lithography. J. Vac. Sci. Technol., B 2008, 26 ,2271-2275.
32. Acikgoz, C.; Vratzov, B.; Hempenius, M. A.; Vancso, G. J.; Huskens, J. Nanoscale Patterning by UV Nanoimprint Lithography Using an Organometallic Resist. J. Appl. Mater. Interfaces 2009, 1,2645-2650.
33. Vogler, M.; Benderb, M.; Plachetka, U.; Fuchs, A.; Wiedenberg, S.; Reuther, F.; Grutzner, G.; Kurz, H. Low Viscosity and Fast Curing Polymer System for UV-Based Nanoimprint Lithography and Its Processing. Proc. SPIE 2007, 6517, 651727-1.
34. Ji, R.; Hornung, M.; Verschuuren, M. A.; van de Laar, R.; van Eekelen, J.; Plachetka, U.; Moeller, M.; Moormann, C. UV Enhanced Substrate Conformal Imprint Lithography (UV-SCIL) Technique for Photonic Crystals Patterning in LED Manufacturing. Microelectron. Eng. 2010,87, 963-967.
35. Houle, F. A.; Miller, D. C.; Fornof, A.; Truong, H.; Raoux, S.; Sooriyakumaran, R.; Ito, H.; Hart, M. Nanoimprint Materials Systems. J. Photopolym. Sci. Technol. 2008, 21, 563-572.
36. Houle, F. A.; Fornof, A.; Miller, D. C.; Raoux, S.; Truong, H.; Simonyi, E.; Jahnes, C.; Rossnagel, S. Chemical and Mechanical Properties of UV-Cured Nanoimprint Resists and Release Layer Interactions. Proc. SPIE 2008, 6921, 69210B-1.
37. Schmid, G. M.; Miller, M.; Brooks, C.; Khusnatdinov, N.; LaBrake, D.; Resnick, D. J.; Sreenivasan, S. V.; Gauzner, G.; Lee, K.; Kuo, D.; Weller, D.; Yang, X. Step and Flash Imprint Lithography for Manufacturing Patterned Media. J. Vac. Sci. Technol., B 2009, 27, 573-580.
38. McMackin, I.; Martin, W.; Perez, J.; Selinidis, K.; Maltabes, J.; Xu, F.; Resnick, D.; Sreenivasanb, S. V. Patterned Wafer Defect Density Analysis of Step and Flash Imprint Lithography. J. Vac. Sci. Technol., B 2008, 26, 151-155.
39. Schmidt, H.; Rinn, G.; Nass, R.; Sporn, D. In Better Ceramics through Chemistry; Brinker, C. J., Clark, D. E., Ulrich, D. R., Eds.; Materials Research Society: Pittsburgh, PA, 1988; 743 pp.
40. (a) Noll, W. Chemistry and Technology of Silicones; Academic Press: Orlando, FL, 1968, Chapter 1.
41. (b) Brook, M. A. Silicon in Organic, Organometallic, and Polymer Chemistry; Wiley: New York, 2000; pp 9-12.
42. Taylor, R. B.; Parbhoo, B.; Fillmore, D. M. In Nuclear Magnetic Resonance Spectroscopy; Smith, L. A., Ed.; Wiley: New York, 1991; Chapter 12.
43. Schmid, H.; Michel, B. Siloxane Polymers for High-Resolution, High-Accuracy Soft Lithography. Macromolecules 2000, 33, 3042-3049.
44. Pina-Hernandez, C.; Fu, P. F.; Guo, L. J. Easy Duplication of Stamps Using UV-Cured Fluoro-Silsesquioxane for Nanoimprint Lithography. J. Vac. Sci. Technol., B 2008, 26, 2426-2429.
45. 2 Nanostructures Fabricated by Block Copolymer Template for Nanoimprint Lithography. ACS Nano 2009, 3, 2601-2608.
46. Heath, W. H.; Palmieri, F.; Adams, J. R.; Long, B. K.; Chute, J.; Holcombe, T. W.; Zieren, S.; Truitt, M. J.; White, J. L.; Willson, C. G. Degradable Cross-Linkers and Strippable Imaging Materials for Step-and-Flash Imprint Lithography. Macromolecules 2008, 41, 719-726.
47. Ahn, S. H.; Guo, L. J. High-Speed Roll-to-Roll Nanoimprint Lithography on Flexible Plastic Substrates. Adv. Mater. 2008, 20, 2044-2049.
48. Kim, E. K.; Ekerdt, J. G.; C.G. Willson, C. G. Importance of Evaporation in the Design of Materials for Step and Flash Imprint Lithography. J. Vac. Sci. Technol., B 2005, 23, 1515-1520.
49. Long, B. K.; Keitz, B. K.; Willson, C. G. Materials for Step and Flash Imprint Lithography (S-FIL). J. Mater. Chem. 2007, 17, 3575-3580.
50. Costner, E. A.; Lin, M. W.; Jen, W. L.; Willson, C. G. Nanoimprint Lithography Materials Development for Semiconductor Device Fabrication. Annu. Rev. Mater. Res. 2009, 39, 155-180.