Advancements and challenges in development of atomic force microscopy for nanofabrication

Nano Today

Volumn 6, Issue 5, 2011, Pages 493-509

  Tseng, Ampere A ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Atomic force microscopy; Multiple energy sources; Multiple probes; Nanofabrication; Parallel processing; Throughput

Indexed keywords

AFM; ATOMIC LEVELS; ENERGY SOURCE; LOW COSTS; NANO SCALE; PARALLEL PROCESSING; POTENTIAL SOLUTIONS; SPEED INCREASING;

NANOTECHNOLOGY; PRODUCTIVITY; THROUGHPUT;

ATOMIC FORCE MICROSCOPY;

ATOMIC FORCE MICROSCOPY; AUTOMATION; COMPUTER PROGRAM; MECHANICAL PROBE; NANOFABRICATION; NANOPROBE; OXIDATION; PRODUCTIVITY; REPRODUCIBILITY; REVIEW;

EID: 80053924655     PISSN: 17480132     EISSN: 1878044X     Source Type: Journal    
DOI: 10.1016/j.nantod.2011.08.003     Document Type: Review

References (71)

1. A.A. Tseng, A. Notargiacomo, and T.P. Chen J. Vac. Sci. Technol. B 23 2005 877
2. N. Kawasegi, D.W. Lee, N. Morita, and J.W. Park A.A. Tseng, Nanofabrication: Fundamentals and Applications 2008 World Scientific Singapore 33 64
3. A.A. Tseng, S. Jou, A. Notargiacomo, and T.P. Chen J. Nanosci. Nanotechnol. 8 2008 2167
4. G. Binnig, C.F. Quate, and C. Gerber Phys. Rev. Lett. 56 1986 930
5. D. Wang, V.K. Kodali, J.E. Curtis, and E. Riedo A.A. Tseng, Tip-Based Nanofabrication: Fundamentals and Applications 2011 Springer-Verlag New York 265 297
6. A.A. Tseng J. Vac. Sci. Technol. B 29 2011 040801
7. O. Custance, R. Perez, and S. Morita Nat. Nanotechnol. 4 2009 803
8. M. Ternes, C.P. Lutz, C.F. Hirjibehedin, F.J. Giessibl, and A.J. Heinrich Science 319 2008 1066
9. I. Brihuega, O. Custance, and J.M. Gómez-Rodríguez Phys. Rev. B 70 2004 165410
10. Y. Sugimoto, M. Abe, S. Hirayama, N. Oyabu, O. Custance, and S. Morita Nat. Mater. 4 2005 156
11. Y. Sugimoto, P. Pou, O. Custance, P. Jelinek, M. Abe, R. Perez, and S. Morita Science 322 2008 413
12. A. Garcia-Martin, and R. Garcia Appl. Phys. Lett. 88 2006 123115
13. A.A. Tseng, T.W. Lee, A. Notargiacomo, T.P. Chen, and J. Micro/Nanolith MEMS MOEMS 8 2009 043050
14. C.F. Chen, S.D. Tzeng, H.Y. Chen, and S. Gwo Opt. Lett. 30 2005 652
15. E.B. Brousseau, F. Krohs, E. Caillaud, S. Dimov, O. Gibaru, and S. Fatikow ASME J. Manuf. Sci. Eng. 132 2010 030901
16. R. Klauser, I.-H. Hong, H.-J. Su, T.T. Chen, S. Gwo, S.-C. Wang, T.J. Chuang, and V.A. Gritsenko Appl. Phys. Lett. 79 2001 3143
17. I. Fernandez-Cuesta, X. Borrise, and F. Perez-Murano J. Vac. Sci. Technol. B 24 2006 2988
18. M. Tello, and R. Garcia Appl. Phys. Lett. 79 2001 424
19. J. Martinez, R.V. Martínez, and R. Garcia Nano Lett. 8 2008 3636
20. A.A. Tseng, C.-F.J. Kuo, S. Jou, S. Nishimura, and J.I. Shirakashi Appl. Surf. Sci. 257 2011 9243
21. A. Imre, G. Csaba, L. Ji, A. Orlov, G.H. Bernstein, and W. Porod Science 311 2006 205
22. K. Bourne, S.G. Kapoor, and R.E. DeVor ASME J. Manuf. Sci. Eng. 132 2010 030906
23. Y. Yan, Z. Hu, X. Zhao, T. Sun, S. Dong, and X. Li Small 6 2010 724
24. A.W. Knoll, D. Pires, O. Coulembier, P. Dubois, J.L. Hedrick, J. Frommer, and U. Duerig Adv. Mater. 22 2010 3361
25. O. Fenwick, L. Bozec, D. Credgington, A. Hammiche, G.M. Lazzerini, Y.R. Silberberg, and F. Cacialli Nat. Nanotechnol. 4 2009 664
26. D. Pires, J.L. Hedrick, A. De Silva, J. Frommer, B. Gotsmann, H. Wolf, M. Despont, U. Duerig, and A.W. Knoll Science 328 2010 732
27. M. Calleja, M. Tello, J. Anguita, F. García, and R. García Appl. Phys. Lett. 79 2001 2471
28. G. Agarwal, R.R. Naik, and M.O. Stone J. Am. Chem. Soc. 125 2003 7408
29. M.D. Croitoru, A. Hochst, G. Bertsche, S. Krauß, S. Roth, and D.P. Kern Microelectron. Eng. 67-68 2003 696
30. K.H. Kim, N. Moldovan, and H.D. Espinosa Small 1 2005 632
31. Y. Lovsky, A. Lewis, C. Sukenik, and E. Grushka Anal. Bioanal. Chem. 396 2010 133
32. K.T. Rodolfa, A. Bruckbauer, D. Zhou, Y.E. Korchev, and D. Klenerman Angew. Chem. Int. Ed. 44 2005 6854
33. S. Ito, T. Keino, and F. Iwata Jpn. J. Appl. Phys. 49 2010 08LB16
34. K. Salaita, Y. Wang, and C.A. Mirkin Nat. Nanotechnol. 2 2007 145
35. S. Xu, and G.Y. Liu Langmuir 13 1997 127
36. M. Liu, N.A. Amro, and G. Liu Annu. Rev. Phys. Chem. 59 2008 367
37. R. Mateiu, A. Kuhle, R. Marie, and A. Boisen Ultramicroscopy 105 2005 233
38. F. Fruk BanoL, B. Sanavio, M. Glettenberg, L. Casalis, C.M. Niemeyer, and G. Scoles Nano Lett. 9 2009 2614
39. C. Staii, D.W. Wood, and G. Scoles Nano Lett. 8 2008 2503
40. S.S. Aphale, B. Bhikkaji, and S.O.R. Moheimani IEEE Trans. Nanotechnol. 7 2008 79
41. I. Mayergoyz Mathematical Models of Hysteresis 1991 Springer New York
42. E. Meyer, H.J. Hug, and R. Bennewitz Scanning Probe Microscopy 2004 Springer Heidelberg, Germany
43. B. Mokaberi, and A.G. Requicha IEEE Trans. Autom. Sci. Eng. 3 2006 3
44. A.J. Fleming, and K.K. Leang Ultramicroscopy 108 2008 1551
45. I.A. Mahmood, and S.O.R. Moheimani Rev. Sci. Instrum. 80 2009 063705
46. S.O.R. Moheimani Rev. Sci. Instrum. 79 2008 071101
47. H. Kuramoch, K. Ando, T. Tokizaki, M. Yasutake, F. Perez-Murano, J.A. Dagata, and H. Yokoyama Surf. Sci. 566-568 2004 343
48. B. Bhikkaji, M. Ratnam, A.J. Fleming, and S.O.R. Moheimani IEEE Trans. Control Syst. Technol. 5 2007 853
49. Y. Yan, Q. Zou, and Z. Lin Nanotechnology 20 2009 175301
50. P. Zahl, M. Bierkandt, S. Schröder, and A. Klust Rev. Sci. Instrum. 74 2003 1222
51. I. Horcas, R. Fernández, J.M. Gómez-Rodríguez, J. Colchero, J. Gómez-Herrero, and A.M. Baro Rev. Sci. Instrum. 78 2007 013705
52. S. Cruchon-Dupeyrat, S. Porthun, and G.Y. Liu Appl. Surf. Sci. 175-176 2001 636
53. M.S. Johannes, J.F. Kuniholm, D.G. Cole, and R.L. Clark IEEE Trans. Autom. Sci. Eng. 3 2006 236
54. R. Resch, C. Baur, A. Bugacov, B.E. Koel, A. Madhukar, A.A.G. Requicha, and P. Will Langmuir 14 1998 6613
55. R. Nishi, D. Miyagawa, Y. Seino, I. Yi, and S. Morita Nanotechnology 17 2006 S142
56. W. Zhao, K. Xu, X. Qian, and R. Wang ASME J. Manuf. Sci. Eng. 132 2010 030909
57. T. Robinson, A. Dinsdale, M. Archuletta, R. Bozak, and R. White Photomask Technology 2008, Proceedings of SPIE, vol. 7122 2008 The International Society for Optical Engineering
58. C. Santschi, J. Polesel-Maris, J. Brugger, and H. Heinzelmann A.A. Tseng, Nanofabrication: Fundamentals and Applications 2008 World Scientific Singapore 65 126
59. X.F. Wang, and C. Liu Nano Lett. 5 2005 1867
60. S.C. Minne, J.D. Adams, G. Yaralioglu, S.R. Manalis, A. Atalar, and C.F. Quate Appl. Phys. Lett. 73 1998 1742
61. H. Pozidis, W. Haberle, D. Wiesmann, U. Drechsler, M. Despont, T.R. Albrecht, and E. Eleftheriou IEEE Trans. Magn. 40 2004 2531
62. C. Hagleitner, T. Bonaccio, H. Rothuizen, J. Lienemann, D. Wiesmann, G. Cherubini, J.G. Korvink, and E. Eleftheriou IEEE J. Solid-State Circuit 42 2007 1779
63. J.P. Yang, J.Q. Mou, N.B. Chong, Y. Lu, H. Zhu, Q. Jiang, W.G. Kim, J. Chen, G.X. Guo, and E.H. Ong Microsyst. Technol. 13 2007 733
64. Y. Rosenwaks, D. Dahan, M. Molotskii, and G. Rosenman Appl. Phys. Lett. 86 2005 012909
65. G.M. Clayton, S. Tien, K.K. Leang, Q. Zou, and S. Devasia ASME J. Dyn. Syst. Meas. Control 131 2009 061101
66. S. Morita, H. Yamada, and T. Ando Nanotechnology 18 2007 084001
67. N. Kodera, M. Sakashita, and T. Ando Rev. Sci. Instrum. 77 2006 083704
68. A.D.L. Humphris, M.J. Miles, and J.K. Hobbs Appl. Phys. Lett. 86 2005 034106
69. L.M. Picco, L. Bozec, A. Ulcinas, D.J. Engledew, M. Antognozzi, M.A. Horton, and M.J. Miles Nanotechnology 18 2007 044030
70. G.E. Fantner, G. Schitter, J.H. Kindt, T. Ivanov, K. Ivanova, R. Patel, N.H. Anderson, J. Adams, P.J. Thurner, I.W. Rangelow, and P.K. Hansma Ultramicroscopy 106 2006 881
71. N. Kodera, H. Yamashita, and T. Ando Rev. Sci. Instrum. 76 2005 053708