Nanomachining photomask repair of complex patterns

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7122, Issue , 2008, Pages

  Robinson, Tod ^a   Dinsdale, Andrew ^a   Archuletta, Mike ^a   Bozak, Ron ^a   White, Roy ^a  

^a RAVE LLC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

2D SHAPES; AFM; COMPLEX PATTERNS; DIMENSIONAL PRECISION; IMAGING PERFORMANCE; MASK REPAIRS; NANO-MACHINING; PHOTOMASK REPAIRS; RELATIVE STRENGTHS; REPAIR PROCESS; TECHNICAL IMPROVEMENTS; TECHNICAL POTENTIALS;

PHOTOMASKS;

REPAIR;

EID: 62649153270     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.801297     Document Type: Conference Paper

References (3)

1. Tod Robinson, Andrew Dinsdale, Ron Bozak, Roy White, Michael Archuletta, "Nanomachining processes for 45, 32 nm node mask repair and beyond", Proc. SPIE Vol. 7028, pp. 70281 A, (2008). doi: 10.1117/12.793052
2. Tod Robinson, Andrew Dinsdale, Ron Bozak, Bernie Arruza, "Advanced mask particle cleaning solutions", Proc. SPIE Vol. 6730, pp. 67301Y, (2007).
3. International Technology Roadmap for Semiconductors: Lithography, 2007 Edition (2007), http://www.itrs.net/Links/2007ITRS/2007-Chapters/2007- Lithography.pdf, pp. 12-13, 16-19.