Nano-oxidation of silicon surfaces: Comparison of noncontact and contact atomic-force microscopy methods

Applied Physics Letters

Volumn 79, Issue 3, 2001, Pages 424-426

  Tello, M ^a   Garcia R ^a  

^a INSTITUTO DE MICROELECTRÓNICA DE MADRID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ATOMIC FORCE MICROSCOPY; ELECTRIC POTENTIAL; ELECTRON ENERGY LEVELS; LITHOGRAPHY; NANOTECHNOLOGY; OXIDATION;

ENERGY BARRIERS; NANO-OXIDATION;

SEMICONDUCTING SILICON;

EID: 0035898511     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1385582     Document Type: Article

References (24)