Large scale high precision nano-oxidation using an atomic force microscope

Surface Science

Volumn 566-568, Issue 1-3 PART 1, 2004, Pages 343-348

  Kuramochi, H ^a,b   Ando, K ^a,b   Tokizaki, T ^a   Yasutake, M ^a,b   Perez Murano F ^a,c   Dagata, J A ^a,d   Yokoyama, H ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b SEIKO INSTRUMENTS INC   (Japan)

^c INSTITUTO DE MICROELECTRÓNICA DE BARCELONA   (Spain)

^d NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Atomic force microscopy; Oxidation; Silicon

Indexed keywords

BIAS VOLTAGE; HYSTERESIS-CREEP; NANO-OXIDATION; PIEZO SCANNERS;

ATOMIC FORCE MICROSCOPY; CANTILEVER BEAMS; CARBON NANOTUBES; HUMIDITY CONTROL; OPTICAL RESOLVING POWER; PASSIVATION; SILICON;

OXIDATION;

EID: 4544320383     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2004.05.066     Document Type: Conference Paper

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