Automated CAD/CAM-based nanolithography using a custom atomic force microscope

IEEE Transactions on Automation Science and Engineering

Volumn 3, Issue 3, 2006, Pages 236-239

  Johannes, Matthew S ^a   Kuniholm, Jonathan F ^a   Cole, Daniel G ^a   Clark, Robert L ^a  

^a Duke University   (United States)

Author keywords

Atomic force microscopy (AFM); Computer aided design computer aided manufacturing (CAD CAM); Lithography; Nanotechnology; Oxidation

Indexed keywords

ADAPTIVE ALGORITHMS; ATOMIC FORCE MICROSCOPY; AUTOMATION; COMPUTER AIDED DESIGN; COMPUTER AIDED MANUFACTURING; COMPUTER PROGRAMMING LANGUAGES; COMPUTER SOFTWARE; SILICON WAFERS;

COMPUTER AIDED DESIGN/COMPUTER-AIDED MANUFACTURING (CAD/CAM); NANOSCALE PATTERNS; SOFTWARE ALGORITHMS;

NANOTECHNOLOGY;

EID: 33746417169     PISSN: 15455955     EISSN: None     Source Type: Journal    
DOI: 10.1109/TASE.2006.875535     Document Type: Article

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