Formation of uniform nanoscale oxide layers assembled by overlapping oxide lines using atomic force microscopy

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 8, Issue 4, 2009, Pages

  Tseng, Ampere A ^a   Lee, Taewoo ^a   Notargiacomo, Andrea ^b   Chen, T P ^c  

^a Arizona State University   (United States)

^b ROMA TRE UNIVERSITY   (Italy)

^c NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Atomic force microscopy (AFM); Local anodic oxidation (LAO); Nanopatterning; Oxide mask; Silicon; Uniformity

Indexed keywords

ATOMIC FORCE MICROSCOPY; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY;

ASSEMBLING PROCESS; EXPERIMENTAL DATA; LOCAL ANODIC OXIDATION; MATERIAL SURFACE; NANOPATTERNING; NANOSCALE OXIDES; OXIDE LAYER; OXIDE LINES; SCANNING SPEED; SUPERPOSITION PRINCIPLE; UNIFORM LAYER; UNIFORMITY;

ANODIC OXIDATION;

EID: 78649535129     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3268427     Document Type: Article

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