Experimental and theoretical studies of radical production in RF CCP discharge at 81-MHz frequency in Ar/CF4 and Ar/CHF3 mixtures

IEEE Transactions on Plasma Science

Volumn 37, Issue 9 SPEC. ISS. PART 1, 2009, Pages 1683-1696

  Rakhimova, Tatyana V ^a   Braginsky, Oleg V ^a   Klopovskiy, Konstantin S ^a   Kovalev, Alexander S ^a   Lopaev, Dmitry V ^a   Proshina, Olga V ^a   Rakhimov, Alexander T ^a   Shamiryan, Denis ^b   Vasilieva, Anna N ^a   Voloshin, Dmitry G ^a  

^a MOSCOW STATE UNIVERSITY   (Russian Federation)

^b IMEC   (Belgium)

Author keywords

Fluorocarbon plasma; Kinetics of CF4 and CHF3 containing plasmas; Negative ions; Optical emission spectroscopy; Particle in cell (PIC) simulation; Probe measurement; Radio frequency capacitive coupled plasma (RF CCP); UVabsorption spectroscopy

Indexed keywords

FLUOROCARBON PLASMA; PARTICLE-IN-CELL (PIC) SIMULATION; PROBE MEASUREMENT; RADIO-FREQUENCY CAPACITIVE-COUPLED PLASMA (RF CCP); UVABSORPTION SPECTROSCOPY;

ABSORPTION SPECTROSCOPY; CELL MEMBRANES; CHEMICAL BONDS; DISSOCIATION; ELECTRON TEMPERATURE; ELECTRONEGATIVITY; ELECTRONS; EMISSION SPECTROSCOPY; INDUCTIVELY COUPLED PLASMA; LIGHT EMISSION; MECHANISMS; MIXTURES; NEGATIVE IONS; OPTICAL EMISSION SPECTROSCOPY; PHOTORESISTS; PLASMA APPLICATIONS; PLASMA DENSITY; PLASMA JETS; PROBES; SIGNAL INTERFERENCE; SIMULATORS; TABLE LOOKUP;

ELECTRIC DISCHARGES;

EID: 70350128466     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2009.2023849     Document Type: Article

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