Absolute densities and kinetics of H atoms and CFx radicals in low-pressure, high-density CHF3 plasmas

Thin Solid Films

Volumn 506-507, Issue , 2006, Pages 705-709

  Sasaki, K ^a   Okamoto, M ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

Absolute density; CHF3 plasma; Laser induced fluorescence; Surface production

Indexed keywords

FILMS; FLUORESCENCE; FLUOROCARBONS; HELICONS; HYDROGEN; SPECTROSCOPY;

ABSOLUTE DENSITIES; CHAMBER WALL; CHF3 PLASMA; LASER-INDUCED FLUORESCENCE SPECTROSCOPY; RADIAL DISTRIBUTIONS; SURFACE PRODUCTION;

PLASMA DENSITY;

EID: 33645231861     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.08.121     Document Type: Article

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