Sources and sinks of CF and CF2 in a cc-RF CF4-plasma under various conditions

Plasma Sources Science and Technology

Volumn 14, Issue 1, 2005, Pages 1-11

  Fendel, Peter ^a,b   Francis, Anne ^a,c   Czarnetzki, Uwe ^a,d  

^a UNIVERSITY OF DUISBURG ESSEN   (Germany)

^b MAX PLANCK INSTITUT FÜR QUANTENOPTIK   (Germany)

^c UNIVERSITY OF WUPPERTAL   (Germany)

^d RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION; DISSOCIATION; ELECTRODES; FLUORESCENCE; FLUOROCARBONS; PLASMA DENSITY; PLASMA ETCHING; PLASMA SHEATHS; PLASTIC FILMS; SPECTROSCOPIC ANALYSIS; STAINLESS STEEL;

ELECTRODE MATERIALS; ION-IMPACT DISSOCIATION; QUADRUPOLE MASS SPECTROMETRY (QMS); VACUUM ULTRAVIOLET ABSORPTION SPECTROSCOPY (VUVAS);

PLASMA SOURCES;

EID: 14644390225     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/14/1/001     Document Type: Article

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