CHF3 dual-frequency capacitively coupled plasma by optical emission spectroscopy

Chinese Physics Letters

Volumn 25, Issue 8, 2008, Pages 2942-2945

  Xu, Yi Jun ^a   Ye, Chao ^a   Huang, Xiao Jiang ^a   Yuan, Jing ^a   Xing, Zhen Yu ^a   Ning, Zhao Yuan ^a  

^a SOOCHOW UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

BOND STRENGTH (CHEMICAL); DISSOCIATION; OPTICAL EMISSION SPECTROSCOPY; SILICON COMPOUNDS;

DISSOCIATION REACTIONS; DUAL FREQUENCY; DUAL-FREQUENCY CAPACITIVELY COUPLED PLASMAS; GAS-PHASES; LOW DIELECTRIC CONSTANTS; LOW-K FILMS; OPTICAL-EMISSION SPECTROSCOPY; POWER; RADICAL CONCENTRATION; SPATIAL UNIFORMITY;

ETCHING;

EID: 49749086114     PISSN: 0256307X     EISSN: 17413540     Source Type: Journal    
DOI: 10.1088/0256-307X/25/8/057     Document Type: Article

References (18)

1. Shamiryan D, Abell T, Iacopi F and Maex K 2004 Mater. Today 7 34
2. Maex K, Baklanov M R, Shamiryan D et al 2003 J. Appl. Phys. 93 8793
3. Grill A 2003 J. Appl. Phys. 93 1785
4. Ye C, Ning Z Y, Wang T T et al 2007 J. Electrochem. Soc. 154 G63
5. Ye C, Yu X Z, Wang T T et al 2005 Chin. Phys. Lett. 22 2670
6. Zhang H Y, Ye C, Ning Z Y 2008 Chin. Phys. Lett. 25 636
7. Abe H, Yoneda M and Fujiwara N 2008 Japan. J. Appl. Phys. 47 1435
8. Eon D, Raballand V, Cartry G et al 2007 J. Phys. D: Appl. Phys. 40 3951
9. Tatsumi T 2007 Appl. Surf. Sci. 253 6716
10. Ishihara K, Shimada T, Yagisawa T et al 2006 Plasma Phys. Control. Fusion 48 B99
11. Miyauchi M, Miyoshi Y, Petrović Z Lj et al 2007 Solid-State Electronics 51 1418
12. Dai Z L, Liu C S and Wang Y N 2008 Chin. Phys. Lett. 25 632
13. Wang L H, Dai Z L and Wang Y N 2006 Chin. Phys. Lett. 23 668
14. Gans T, Schulze J, O'Connell D et al 2006 Appl. Phys. Lett. 89 261502
15. Karkari S K and Ellingboe A R 2006 Appl. Phys. Lett. 88 101501
16. Samukawa S and Furuoya S 1993 Appl. Phys. Lett. 63 2044
17. Horii N M, Okimura K and Shibata A 1999 Thin Solid Films 343-344 148
18. Takahashi K, Hori M and Goto T 1994 Japan. J. Appl. Phys. 33 4745