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Volumn 35, Issue 5 I, 2007, Pages 1229-1240

Experimental and theoretical study of ion energy distribution function in single and dual frequency RF discharges

Author keywords

Dual frequency (DF) capacitive coupled radio frequency (RF) plasma; IEDF measurement; Ion energy distribution functions (IEDFs) analytical expression; Particle in cell (PIC) simulation; Semianalytical IEDF simulation

Indexed keywords

CHARGE DISTRIBUTION; COMPUTER SIMULATION; DISTRIBUTION FUNCTIONS; ELECTRIC DISCHARGES; ELECTRODES; IONS; MONTE CARLO METHODS;

EID: 35348823076     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2007.905201     Document Type: Article
Times cited : (45)

References (45)
  • 2
    • 33751393501 scopus 로고
    • Dual excitation reactive ion etcher for low energy plasma processing
    • Sep
    • H. H. Goto, H.-D. Lowe, and T. Ohmi, "Dual excitation reactive ion etcher for low energy plasma processing," J. Vac. Sci. Technol. A, Vac. Surf. Films, vol. 10, no. 5, pp. 3048-3054, Sep. 1992.
    • (1992) J. Vac. Sci. Technol. A, Vac. Surf. Films , vol.10 , Issue.5 , pp. 3048-3054
    • Goto, H.H.1    Lowe, H.-D.2    Ohmi, T.3
  • 3
    • 0027544933 scopus 로고
    • Independent control of ion density and ion bombardment energy in a dual RF excitation plasma
    • Feb
    • H. H. Goto, H.-D. Lowe, and T. Ohmi, "Independent control of ion density and ion bombardment energy in a dual RF excitation plasma," IEEE Trans. Semicond. Manuf., vol. 6, no. 1, pp. 58-64, Feb. 1993.
    • (1993) IEEE Trans. Semicond. Manuf , vol.6 , Issue.1 , pp. 58-64
    • Goto, H.H.1    Lowe, H.-D.2    Ohmi, T.3
  • 4
    • 0033466459 scopus 로고    scopus 로고
    • Two-dimensional CT images of two-frequency capacitively coupled plasma
    • Sep
    • T. Kitajima, Y. Takeo, and T. Makabe, "Two-dimensional CT images of two-frequency capacitively coupled plasma," J. Vac. Sci. Technol. A, Vac. Surf. Films, vol. 17, no. 5, pp. 2510-2516, Sep. 1999.
    • (1999) J. Vac. Sci. Technol. A, Vac. Surf. Films , vol.17 , Issue.5 , pp. 2510-2516
    • Kitajima, T.1    Takeo, Y.2    Makabe, T.3
  • 5
    • 0001480674 scopus 로고    scopus 로고
    • Functional separation of biasing and sustaining voltages in two-frequency capacitively coupled plasma
    • Jul
    • T. Kitajima, Y. Takeo, Z. L. Petrovic, and T. Makabe, "Functional separation of biasing and sustaining voltages in two-frequency capacitively coupled plasma," Appl. Phys. Lett., vol. 77, no. 4, pp. 489-491, Jul. 2000.
    • (2000) Appl. Phys. Lett , vol.77 , Issue.4 , pp. 489-491
    • Kitajima, T.1    Takeo, Y.2    Petrovic, Z.L.3    Makabe, T.4
  • 6
    • 0036672649 scopus 로고    scopus 로고
    • Standing wave and skin effects in large-area, high-frequency capacitive discharges
    • Aug
    • M. A. Lieberman, J. P. Booth, P. Chabert, J. M. Rax, and M. M. Turner, "Standing wave and skin effects in large-area, high-frequency capacitive discharges," Plasma Sources Sci. Technol., vol. 11, no. 3, pp. 283-293, Aug. 2002.
    • (2002) Plasma Sources Sci. Technol , vol.11 , Issue.3 , pp. 283-293
    • Lieberman, M.A.1    Booth, J.P.2    Chabert, P.3    Rax, J.M.4    Turner, M.M.5
  • 7
    • 37649029487 scopus 로고    scopus 로고
    • Numerical investigation of ion-energy-distribution functions in single and dual frequency capacitively coupled plasma reactors
    • V. Georgieva, A. Bogaerts, and R. Gijbels, "Numerical investigation of ion-energy-distribution functions in single and dual frequency capacitively coupled plasma reactors," Phys. Rev. E, Stat. Phys. Plasmas Fluids Relat. Interdiscip. Top., vol. 69, no. 2, p. 026 406, 2004.
    • (2004) Phys. Rev. E, Stat. Phys. Plasmas Fluids Relat. Interdiscip. Top , vol.69 , Issue.2 , pp. 026-406
    • Georgieva, V.1    Bogaerts, A.2    Gijbels, R.3
  • 8
    • 33745586628 scopus 로고    scopus 로고
    • Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor: Numerical investigation by a PIC/MC model
    • Aug
    • V. Georgieva and A. Bogaerts, "Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor: Numerical investigation by a PIC/MC model," Plasma Sources Sci. Technol., vol. 15, no. 3, pp. 368-377, Aug. 2006.
    • (2006) Plasma Sources Sci. Technol , vol.15 , Issue.3 , pp. 368-377
    • Georgieva, V.1    Bogaerts, A.2
  • 9
    • 0141955878 scopus 로고    scopus 로고
    • Numerical study of Ar/CF4/N2 discharges in single- and dual-frequency capacitively coupled plasma reactors
    • Sep
    • V. Georgieva, A. Bogaerts, and R. Gijbels, "Numerical study of Ar/CF4/N2 discharges in single- and dual-frequency capacitively coupled plasma reactors," J. Appl. Phys., vol. 94, no. 6, pp. 3748-3756, Sep. 2003.
    • (2003) J. Appl. Phys , vol.94 , Issue.6 , pp. 3748-3756
    • Georgieva, V.1    Bogaerts, A.2    Gijbels, R.3
  • 10
    • 23844533315 scopus 로고    scopus 로고
    • V. Georgieva and A. Bogaerts, Numerical simulation of dual frequency etching reactors: Influence of the external process parameters on the plasma characteristics, J. Appl. Phys., 98, no. 2, pp. 023 308.1-023 308.13, 2005.
    • V. Georgieva and A. Bogaerts, "Numerical simulation of dual frequency etching reactors: Influence of the external process parameters on the plasma characteristics," J. Appl. Phys., vol. 98, no. 2, pp. 023 308.1-023 308.13, 2005.
  • 11
    • 14644407418 scopus 로고    scopus 로고
    • Ion energy distribution control in single and dual frequency capacitive plasma sources
    • Feb
    • J. K. Lee, O. V. Manuilenko, N. Y. Babaeva, H. C. Kim, and J. W. Shon, "Ion energy distribution control in single and dual frequency capacitive plasma sources," Plasma Sources Sci. Technol., vol. 14, no. 1, pp. 89-97, Feb. 2005.
    • (2005) Plasma Sources Sci. Technol , vol.14 , Issue.1 , pp. 89-97
    • Lee, J.K.1    Manuilenko, O.V.2    Babaeva, N.Y.3    Kim, H.C.4    Shon, J.W.5
  • 12
    • 4444337637 scopus 로고    scopus 로고
    • Electrostatic modelling of dual frequency RF plasma discharges
    • Aug
    • P. C. Boyle, A. R. Ellingboe, and M. M. Turner, "Electrostatic modelling of dual frequency RF plasma discharges," Plasma Sources Sci. Technol., vol. 13, no. 3, pp. 493-503, Aug. 2004.
    • (2004) Plasma Sources Sci. Technol , vol.13 , Issue.3 , pp. 493-503
    • Boyle, P.C.1    Ellingboe, A.R.2    Turner, M.M.3
  • 13
    • 2542536177 scopus 로고    scopus 로고
    • Modelling of the dual frequency capacitive sheath in the intermediate pressure range
    • May
    • P. C. Boyle, J. Robiche, and M. M. Turner, "Modelling of the dual frequency capacitive sheath in the intermediate pressure range," J. Phys. D, Appl. Phys., vol. 37, no. 10, pp. 1451-1458, May 2004.
    • (2004) J. Phys. D, Appl. Phys , vol.37 , Issue.10 , pp. 1451-1458
    • Boyle, P.C.1    Robiche, J.2    Turner, M.M.3
  • 14
    • 0041426369 scopus 로고    scopus 로고
    • Study on the dual frequency capacitively coupled plasmas by the particle-in-cell/Monte Carlo method
    • Aug
    • G. Wakayama and K. Nanbu, "Study on the dual frequency capacitively coupled plasmas by the particle-in-cell/Monte Carlo method," IEEE Trans. Plasma Sci., vol. 31, no. 4, pp. 638-644, Aug. 2003.
    • (2003) IEEE Trans. Plasma Sci , vol.31 , Issue.4 , pp. 638-644
    • Wakayama, G.1    Nanbu, K.2
  • 15
    • 0026989891 scopus 로고
    • A dual frequency plasma sheath model
    • Dec
    • F. R. Myers and T. S. Cale, "A dual frequency plasma sheath model," J. Electrochem. Soc., vol. 139, no. 12, pp. 3587-3595, Dec. 1992.
    • (1992) J. Electrochem. Soc , vol.139 , Issue.12 , pp. 3587-3595
    • Myers, F.R.1    Cale, T.S.2
  • 16
    • 29544437322 scopus 로고    scopus 로고
    • Z. Guan, Z. Dai, and Y. Wang, Simulations of dual RF-biased sheaths and ion energy distributions arriving at a dual RF-biased electrode, Phys. Plasmas, 12, no. 12, pp. 123 502-1-123 502-8, Dec. 2005.
    • Z. Guan, Z. Dai, and Y. Wang, "Simulations of dual RF-biased sheaths and ion energy distributions arriving at a dual RF-biased electrode," Phys. Plasmas, vol. 12, no. 12, pp. 123 502-1-123 502-8, Dec. 2005.
  • 17
    • 0041733196 scopus 로고    scopus 로고
    • Analytical model of a dual frequency capacitive sheath
    • Aug
    • J. Robiche, P. C. Boyle, M. M. Turner, and A. R. Ellingboe, "Analytical model of a dual frequency capacitive sheath," J. Phys. D, Appl. Phys., vol. 36, no. 15, pp. 1810-1816, Aug. 2003.
    • (2003) J. Phys. D, Appl. Phys , vol.36 , Issue.15 , pp. 1810-1816
    • Robiche, J.1    Boyle, P.C.2    Turner, M.M.3    Ellingboe, A.R.4
  • 18
    • 0344980603 scopus 로고    scopus 로고
    • Analytic model for a dual frequency capacitive discharge
    • Nov
    • H. C. Kim, J. K. Lee, and J. W. Shon, "Analytic model for a dual frequency capacitive discharge," Phys. Plasmas, vol. 10, no. 11, pp. 4545-4551, Nov. 2003.
    • (2003) Phys. Plasmas , vol.10 , Issue.11 , pp. 4545-4551
    • Kim, H.C.1    Lee, J.K.2    Shon, J.W.3
  • 19
    • 19744382874 scopus 로고    scopus 로고
    • Ion energy uniformity in high-frequency capacitive discharges
    • Jan
    • A. Perret, P. Chabert, J. Jolly, and J.-P. Booth, "Ion energy uniformity in high-frequency capacitive discharges," Appl. Phys. Lett., vol. 86, no. 2, p. 021 501, Jan. 2005.
    • (2005) Appl. Phys. Lett , vol.86 , Issue.2 , pp. 021-501
    • Perret, A.1    Chabert, P.2    Jolly, J.3    Booth, J.-P.4
  • 20
  • 23
    • 33745622188 scopus 로고    scopus 로고
    • A particle-in-cell Monte Carlo simulation of an RF discharge in methane: Frequency and pressure features of the ion energy distribution function
    • Aug
    • O. V. Proshina, T. V. Rakhimova, and A. T. Rakhimov, "A particle-in-cell Monte Carlo simulation of an RF discharge in methane: Frequency and pressure features of the ion energy distribution function," Plasma Sources Sci. Technol., vol. 15, no. 3, pp. 402-409, Aug. 2006.
    • (2006) Plasma Sources Sci. Technol , vol.15 , Issue.3 , pp. 402-409
    • Proshina, O.V.1    Rakhimova, T.V.2    Rakhimov, A.T.3
  • 24
    • 36549099421 scopus 로고
    • Distribution of ion energies incident on electrodes in capacitively coupled RF discharges
    • Dec
    • M. J. Kushner, "Distribution of ion energies incident on electrodes in capacitively coupled RF discharges," J. Appl. Phys., vol. 58, no. 11, pp. 4024-4031, Dec. 1985.
    • (1985) J. Appl. Phys , vol.58 , Issue.11 , pp. 4024-4031
    • Kushner, M.J.1
  • 25
    • 0026139803 scopus 로고
    • Ion kinetics in low-pressure, electropositive, RF glow discharge sheaths
    • Apr
    • M. S. Barnes, J. C. Forster, and J. H. Keller, "Ion kinetics in low-pressure, electropositive, RF glow discharge sheaths," IEEE Trans. Plasma Sci., vol. 19, no. 2, pp. 240-244, Apr. 1991.
    • (1991) IEEE Trans. Plasma Sci , vol.19 , Issue.2 , pp. 240-244
    • Barnes, M.S.1    Forster, J.C.2    Keller, J.H.3
  • 26
    • 36549092475 scopus 로고
    • Monte Carlo simulation of ion transport through RF glow-discharge sheaths
    • Apr
    • B. E. Thompson, H. H. Sawin, and D. A. Fisher, "Monte Carlo simulation of ion transport through RF glow-discharge sheaths," J. Appl. Phys. vol. 63, no. 7, pp. 2241-2251, Apr. 1988.
    • (1988) J. Appl. Phys , vol.63 , Issue.7 , pp. 2241-2251
    • Thompson, B.E.1    Sawin, H.H.2    Fisher, D.A.3
  • 27
    • 0001225044 scopus 로고    scopus 로고
    • Plasma sheath model and ion energy distribution for all radio frequencies
    • Apr
    • T. Panagopoulos and D. J. Economou, "Plasma sheath model and ion energy distribution for all radio frequencies," J. Appl. Phys., vol. 85, no. 7, pp. 3435-3443, Apr. 1999.
    • (1999) J. Appl. Phys , vol.85 , Issue.7 , pp. 3435-3443
    • Panagopoulos, T.1    Economou, D.J.2
  • 28
    • 0008284330 scopus 로고    scopus 로고
    • Modeling of the sheath and the energy distribution of ions bombarding RF-biased substrates in high-density plasma reactors and comparison to experimental measurements
    • Nov
    • E. A. Edelberg and E. S. Aydil, "Modeling of the sheath and the energy distribution of ions bombarding RF-biased substrates in high-density plasma reactors and comparison to experimental measurements," J. Appl. Phys., vol. 86, no. 9, pp. 4799-4812, Nov. 1999.
    • (1999) J. Appl. Phys , vol.86 , Issue.9 , pp. 4799-4812
    • Edelberg, E.A.1    Aydil, E.S.2
  • 29
    • 41349106343 scopus 로고    scopus 로고
    • Spatiotemporal characteristics of the collisionless RF sheath and the ion energy distributions arriving at RF-biased electrodes
    • Mar
    • Z. Dai, Y. Wang, and T. Ma, "Spatiotemporal characteristics of the collisionless RF sheath and the ion energy distributions arriving at RF-biased electrodes," Phys. Rev. E, Stat. Phys. Plasmas Fluids Relat. Interdiscip. Top., vol. 65, no. 3, p. 036403, Mar. 2002.
    • (2002) Phys. Rev. E, Stat. Phys. Plasmas Fluids Relat. Interdiscip. Top , vol.65 , Issue.3 , pp. 036403
    • Dai, Z.1    Wang, Y.2    Ma, T.3
  • 30
    • 0024131141 scopus 로고
    • Analytical solution for capacitive RF sheath
    • Dec
    • M. A. Lieberman, "Analytical solution for capacitive RF sheath," IEEE Trans. Plasma Sci., vol. PS-16, no. 6, pp. 638-644, Dec. 1988.
    • (1988) IEEE Trans. Plasma Sci , vol.PS-16 , Issue.6 , pp. 638-644
    • Lieberman, M.A.1
  • 31
    • 34250857477 scopus 로고
    • Dynamics of a collisional, capacitive RF sheath
    • Apr
    • M. A. Lieberman, "Dynamics of a collisional, capacitive RF sheath," IEEE Trans. Plasma Sci., vol. 17, no. 2, pp. 338-341, Apr. 1989.
    • (1989) IEEE Trans. Plasma Sci , vol.17 , Issue.2 , pp. 338-341
    • Lieberman, M.A.1
  • 33
    • 0032654285 scopus 로고    scopus 로고
    • Ion energy distributions in RF sheaths; review, analysis and simulation
    • Aug
    • E. Kawamura, V. Vahedi, M. A. Lieberman, and C. K. Birdsall, "Ion energy distributions in RF sheaths; review, analysis and simulation," Plasma Sources Sci. Technol., vol. 8, no. 3, pp. R45-R64, Aug. 1999.
    • (1999) Plasma Sources Sci. Technol , vol.8 , Issue.3
    • Kawamura, E.1    Vahedi, V.2    Lieberman, M.A.3    Birdsall, C.K.4
  • 34
    • 0242657883 scopus 로고    scopus 로고
    • The dual frequency radio-frequency sheath revisited
    • Nov
    • R. N. Franklin, "The dual frequency radio-frequency sheath revisited," J. Phys. D, Appl. Phys., vol. 36, no. 21, pp. 2660-2661, Nov. 2003.
    • (2003) J. Phys. D, Appl. Phys , vol.36 , Issue.21 , pp. 2660-2661
    • Franklin, R.N.1
  • 35
    • 6344229755 scopus 로고    scopus 로고
    • Sheath model for dual-frequency capacitively coupled plasmas
    • Aug
    • K. Denpoh, G. Wakayama, and K. Nanbu, "Sheath model for dual-frequency capacitively coupled plasmas," Jpn. J. Appl. Phys., vol. 43, no. 8A, pp. 5533-5539, Aug. 2004.
    • (2004) Jpn. J. Appl. Phys , vol.43 , Issue.8 A , pp. 5533-5539
    • Denpoh, K.1    Wakayama, G.2    Nanbu, K.3
  • 36
    • 1642603423 scopus 로고    scopus 로고
    • Independent control of ion current and ion impact energy onto electrodes in dual frequency plasma devices
    • Mar
    • P. C. Boyle, A. R. Ellingboe, and M. M. Turner, "Independent control of ion current and ion impact energy onto electrodes in dual frequency plasma devices," J. Phys. D, Appl. Phys., vol. 37, no. 5, pp. 697-701, Mar. 2004.
    • (2004) J. Phys. D, Appl. Phys , vol.37 , Issue.5 , pp. 697-701
    • Boyle, P.C.1    Ellingboe, A.R.2    Turner, M.M.3
  • 37
    • 35348814479 scopus 로고    scopus 로고
    • General talk for graduate students, Online, Available
    • M. A. Lieberman, "Plasma processing in the 21st century," General talk for graduate students. [Online]. Available: http://www.eecs.berkeley.edu/~lieber/
    • Plasma processing in the 21st century
    • Lieberman, M.A.1
  • 38
    • 35348841646 scopus 로고    scopus 로고
    • O. V. Braginsky, A. S. Kovalev, D. V. Lopaev, T. V. Rakhimova, A. T. Rakhimov, D. G. Voloshin, and A. N. Vasilieva, Experimental study of dual frequency RF discharges in argon for different gas pressures, in Proc. XXVIII Int. Conf. Phenom. Ionized Gases, Prague, Czech Republic, 5P09-21, Jul. 15-20, 2007, pp. 2114-2117.
    • O. V. Braginsky, A. S. Kovalev, D. V. Lopaev, T. V. Rakhimova, A. T. Rakhimov, D. G. Voloshin, and A. N. Vasilieva, "Experimental study of dual frequency RF discharges in argon for different gas pressures," in Proc. XXVIII Int. Conf. Phenom. Ionized Gases, Prague, Czech Republic, 5P09-21, Jul. 15-20, 2007, pp. 2114-2117.
  • 39
    • 36449005458 scopus 로고
    • The application of scattering cross section to ion flux models in discharge sheath
    • Jul
    • A. V. Phelps, "The application of scattering cross section to ion flux models in discharge sheath," J. Appl. Phys., vol. 76, no. 2, pp. 747-753, Jul. 1994.
    • (1994) J. Appl. Phys , vol.76 , Issue.2 , pp. 747-753
    • Phelps, A.V.1
  • 41
    • 0026820114 scopus 로고
    • Monte Carlo simulation of electron motion in mercury vapour
    • Feb
    • J. Liu and G. R. G. Raju, "Monte Carlo simulation of electron motion in mercury vapour," J. Phys. D, Appl. Phys., vol. 25, no. 2, pp. 167-172, Feb. 1992.
    • (1992) J. Phys. D, Appl. Phys , vol.25 , Issue.2 , pp. 167-172
    • Liu, J.1    Raju, G.R.G.2
  • 42
    • 4243962979 scopus 로고
    • Monte Carlo simulations of space-charge-limited ion transport through collisional plasma sheaths
    • Aug
    • R. T. Farouki, S. Hamaguchi, and M. Dalvie, "Monte Carlo simulations of space-charge-limited ion transport through collisional plasma sheaths," Phys. Rev. A, Gen. Phys., vol. 44, no. 4, pp. 2664-2681, Aug. 1991.
    • (1991) Phys. Rev. A, Gen. Phys , vol.44 , Issue.4 , pp. 2664-2681
    • Farouki, R.T.1    Hamaguchi, S.2    Dalvie, M.3
  • 43
    • 0036672649 scopus 로고    scopus 로고
    • Standing wave and skin effects in large-area, high-frequency capacitive discharges
    • Aug
    • M. A. Lieberman, J. P. Booth, P. Chabert, J. M. Rax, and M. M. Turner, "Standing wave and skin effects in large-area, high-frequency capacitive discharges," Plasma Sources Sci. Technol., vol. 11, no. 3, pp. 283-293, Aug. 2002.
    • (2002) Plasma Sources Sci. Technol , vol.11 , Issue.3 , pp. 283-293
    • Lieberman, M.A.1    Booth, J.P.2    Chabert, P.3    Rax, J.M.4    Turner, M.M.5
  • 44
    • 33947636102 scopus 로고    scopus 로고
    • Electromagnetic effects in high-frequency capacitive discharges used for plasma processing
    • Feb
    • P. Chabert, "Electromagnetic effects in high-frequency capacitive discharges used for plasma processing," J. Phys. D, Appl. Phys., vol. 40, no. 3, pp. R63-R73, Feb. 2007.
    • (2007) J. Phys. D, Appl. Phys , vol.40 , Issue.3
    • Chabert, P.1
  • 45
    • 35348893333 scopus 로고    scopus 로고
    • Analytical calculation of ion energy distribution function in dual frequency RE discharges
    • Prague, Czech Republic, 5P09-16, Jul. 15-20
    • M. A. Olevanov, T. V. Rakhimova, and D. G. Voloshin, "Analytical calculation of ion energy distribution function in dual frequency RE discharges," in Proc. XXVIII Int. Conf. Phenom. Ionized Gases, Prague, Czech Republic, 5P09-16, Jul. 15-20, 2007, pp. 2094-2097.
    • (2007) Proc. XXVIII Int. Conf. Phenom. Ionized Gases , pp. 2094-2097
    • Olevanov, M.A.1    Rakhimova, T.V.2    Voloshin, D.G.3


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