Use of the ultraviolet absorption spectrum of CF 2 to determine the spatially resolved absolute CF 2 density, rotational temperature, and vibrational distribution in a plasma etching reactor

Journal of Chemical Physics

Volumn 120, Issue 20, 2004, Pages 9499-9508

  Bulcourt, Nicolas ^a   Booth, Jean Paul ^a   Hudson, Eric A ^b   Luque, Jorge ^b   Mok, Daniel K W ^c   Edmond, P Lee ^c,d   Chau, Foo Tim ^c   Dyke, John M ^d  

^a ECOLE POLYTECHNIQUE   (France)

^b LAM RESEARCH CORPORATION   (United States)

^c HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

^d UNIVERSITY OF SOUTHAMPTON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

BOLTZMANN DISTRIBUTIONS; FRANCK-CONDON FACTORS; PLASMA ETCH REACTORS; VIBRATIONAL ENERGY;

ABSORPTION SPECTROSCOPY; DIELECTRIC MATERIALS; FLUOROCARBONS; GROUND STATE; INTEGRATED CIRCUITS; LIGHT ABSORPTION; MIXTURES; MOLECULAR VIBRATIONS; PLASMA ETCHING; PLASMAS; SILICON WAFERS;

CARBON INORGANIC COMPOUNDS;

EID: 2942529083     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1695313     Document Type: Article

References (27)

1. K. Sasaki, H. Furukawa, K. Kudota, and C. Suzuki, J. Appl. Phys. 88, 5585 (2000).
2. M. Nakamura, M. Hori, T. Goto, M. Ito, and N. Nishii, J. Appl. Phys. 90, 580 (2001).
3. B. K. McMillin and M. R. Zachariah, J. Vac. Sci. Technol. A 15, 230 (1997).
4. C. Suzuki, K. Sasaki, and K. Kadota, J. Vac. Sci. Technol. A 16, 2222 (1998).
5. G. A. Hebner, J. Appl. Phys. 89, 900 (2001).
6. J. P. Booth, Plasma Sources Sci. Technol. 8, 249 (1999).
7. G. Cunge and J. P. Booth, J. Appl. Phys. 85, 3952 (1999).
8. J. P. Booth, G. Cunge, P. Chabert, and N. Sadeghi, J. Appl. Phys. 85, 3097 (1999).
9. J. P. Booth, G. Cunge, E Neuilly, and N. Sadeghi, Plasma Sources Sci. Technol. 7, 423 (1998).
10. B. A. Cruden, K. K. Gleason, and H. H. Sawin, J. Appl. Phys. 89, 915 (2001).
11. J. A. O'Neill and J. Singh, J. Appl. Phys. 76, 5967 (1994).
12. J. A. O'Neill and J. Singh, J. Appl. Phys. 77, 497 (1995).
13. H. Kim and F. L. Terry, Jr., Proc. SPIE 3742, 136 (1999).
14. D. S. King, P. K. Schenck, and J. C. Stephenson, J. Mol. Spectrosc. 78, 1 (1979).
15. F. T. Chau, J. M. Dyke, E. P. F. Lee, and D. K. W. Mok, J. Chem. Phys. 115, 5816 (2001).
16. F. T. Chau, J. M. Dyke, E. P. F. Lee, and D. C. Wang, J. Electron Spectrosc. Relat. Phenom. 97, 33 (1998).
17. J. Luque, E. A. Hudson, and J. P. Booth, J. Chem. Phys. 118, 622 (2003).
18. J. Luque, E. A. Hudson, J. P. Booth, and I. D. Petsalakis, J. Chem. Phys. 118, 1206 (2003).
19. CRC Handbook of Chemistry and Physics, 63rd ed., edited by R. C. Weast (CRC, Boca Raton, FL, 1982).
20. MOLPRO is a package of ab initio programs written by H.-J. Werner and P. J. Knowles; version 2002.1, with contributions from J. Almlöf, R. D. Amos, A. Berning et al.
21. W. Meyer, P. Botschwina, and P. Burton, J. Chem. Phys. 84, 891 (1986).
22. S. Carter and N. C. Handy, J. Chem. Phys. 87, 4294 (1987).
23. R. N. Dixon (private communication).
24. H. B. Qian and P. B. Davies, J. Mol. Spectrosc. 169, 201 (1995).
25. C. W. Mathews, Can. J. Phys. 45, 2355 (1967).
26. W. Hack and A. Wilms, J. Phys. Chem. 90, 4007 (1986).
27. S. Sharpe, B. Harnett, H. S. Sethi, and D. S. Sethi, J. Photochem. 38, 1 (1987).