Electron interaction cross sections for CF3l, C 2F4, and CFx (x=1-3) radicals

Journal of Physical and Chemical Reference Data

Volumn 35, Issue 1, 2006, Pages 267-284

  Rozum, I ^a,c   Limao Vieira P ^a,d   Eden, S ^a   Tennyson, J ^a   Mason, N J ^b  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

^b OPEN UNIVERSITY   (United Kingdom)

^c UNIVERSITY COLLEGE LONDON   (United Kingdom)

^d UNIVERSIDADE NOVA DE LISBOA   (Portugal)

Author keywords

Cross sections; Dissociative electron attachment; Electron molecule collisions; Electronic excitation; Ionization; Resonances; Technological plasmas

Indexed keywords

ELECTRON ENERGY ANALYZERS; ELECTRON SCATTERING; ELECTRONS; ETCHING; IONIZATION; IONIZATION OF GASES; RESONANCE;

ACTIVE RADICAL SPECIES; CROSS SECTIONS; DISSOCIATIVE ELECTRON ATTACHMENT; ELECTRON IMPACT DISSOCIATION; ELECTRON INTERACTION; ELECTRON-MOLECULE COLLISIONS; ELECTRONIC EXCITATION; RECOMMENDED CROSS-SECTIONS;

PHOTODISSOCIATION;

EID: 33748506510     PISSN: 00472689     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2149379     Document Type: Article

References (56)

1. B. Graham, Physics World 14, 31 (2001).
2. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Material. Processing (Wiley, New York, 1994).
3. Agenda, Conf. Parties 3, Kyoto, Item 5 (1997).
4. T. Goto, Adv. At. Mol. Phys. 44, 99 (2001).
5. T. Makabe, Adv. At. Mol. Phys. 44, 127 (2001).
6. S. Raoux, M. B. T. Tanaka, H. Ponnekanti, M. Seamons, T. Deacon, L. Xia, F. Pham, D. Silvetti, D. Cheung, and K. Fairbairn, J. Vac. Sci. Technol. B 71(2), 477 (1999).
7. IPCC, International Panel on Climate Change, The Third Assessment Report (www.ipcc.ch) (2001).
8. S. Solomon, J. B. Burkholder, A. R. Ravishankara, and R. R. Garcia, J. Geophys. Res. 99, 20929 (1994).
9. G. Acerboni, J. A. Buekes, N. R. Jensen, J. Hjorth, G. Myhre, C. J. Nielsen, and J. K. Sundet, Atm. Environ. 35, 4113 (2001).
10. S. Samukawa and T. Mukai, J. Vac. Sci. Technol. A 17, 2551 (1999).
11. T. Oster, O. Ingólfsson, M. Meinke, T. Jaffke, and E. Illenberger, J. Chem. Phys. 99, 5141 (1993).
12. T. K. Minton, P. Felder, R. C. Scales, and J. R. Huber, Chem. Phys. Lett. 164, 113 (1989).
13. S. Samukawa, T. Mukai, and K. Noguchi, Mater. Sci. Semicond. Process. 2, 203 (1999).
14. L. G. Christophorou and J. K. Olthoff, J. Phys. Chem. Ref. Data 29(4), 553 (2000).
15. L. G. Christophorou and J. K. Olthoff, Appl. Surf. Sci. 192, 309 (2002).
16. I. Rozum, N. J. Mason, and J. Tennyson, J. Phys. B: At. Mol. Opt. Phys. 35, 1583 (2002).
17. I. Rozum, N. J. Mason, and J. Tennyson, J. Phys. B: At. Mol. Opt. Phys. 36, 2419 (2003a).
18. I. Rozum, N. J. Mason, and J. Tennyson, New J. Phys. 5, 155.1 (2003b).
19. I. Rozum and J. Tennyson, J. Phys. B: At. Mol. Opt. Phys. 37, 957 (2004).
20. L. G. Christophorou, Plenary Talks, The Technological Plasmas Workshop, Birmingham, UK, 2003.
21. V. Tamovsky and K. Becker, J. Chem. Phys. 98, 7868 (1993).
22. V. Tarnovsky, P. Kurunczi, D. Rogozhnikov, and K. Becker, Int. J. Mass Spectrom. Ion Processes 128, 181 (1993).
23. M. H. Bettega, A. Natalense, M. Lima, and L. G. Ferreira, J. Phys. B: At. Mol. Opt. Phys. 34, 4041 (2003).
24. N. J. Mason, P. Limão-Vieira, S. Eden, P. Kendall, S. Pathak, A. Dawes, J. Tennyson, P. Tegeder, M. Kitajima, M. Okamoto, et al., Intern. J. Mass Spectrom. 223, 647 (2003).
25. C. Szmytkowski, S. Kwitnewski, and E. Ptasiska-Denga, Phys. Rev. A 68, 032715 (2003).
26. C. Winstead and V. McKoy, J. Chem. Phys. 116, 1380 (2002).
27. S. Eden, P. Limão-Vieira, P. A. Kendall, N. J. Mason, J. Delwiche, M. Hubin-Franskin, T. Tanaka, M. Kitajima, H. Tanaka, H. Cho, et al., Chem. Phys. 297, 257 (2004).
28. M. Kitajima, M. Okamoto, K. Sunohara, H. Tanaka, H. Cho, S. Samukawa, S. Eden, and N. J. Mason, J. Phys. B: At. Mol. Opt. Phys. 35, 3257 (2002).
29. K. Sunohara, M. Kitajima, H. Tanaka, M. Kimura, and H. Cho, J. Phys. B: At. Mol. Opt. Phys. 36, 1843 (2003).
30. M. Kitajima, R. Suzuki, H. Tanaka, L. Pichl, and H. Cho, Nukleonika 48, 89 (2003).
31. M. K. Kawada, O. Sueoka, and M. Kimura, Chem. Phys. Lett. 330, 34 (2000).
32. K. N. Joshipura, V. Minaxi, C. G. Limbachiya, and B. K. Antony, Phys. Rev. A 69, 022705 (2004).
33. C. Q. Jiao, G. Ganguly, C. A. DeJoseph, and A. Garscadden, Int. J. Mass Spectrom. 208, 127 (2001).
34. U. Onthong, H. Deutsch, K. Becker, S. Matt. M. Probst, and T. D. Märk, Int. J. Mass Spectrom. 214, 53 (2002).
35. K. N. Joshipura, M. Vinodkumar, B. K. Antony, and N. J. Mason, Eur. Phys J. D 23, 81 (2003).
36. T. Nakumura, H. Motomura, and K. Tachibana, Jpn. J. Appl. Phys. 30, 847 (2001).
37. Y. Jiang, J. Sun, and L. Wan, Phys. Rev. A 62, 062712 (2000).
38. K. Yoshida, S. Goto, H. Tagashira, C. Winstead, B. V. McKoy, and W. L. Morgan, J. Appl. Phys. 91, 2637 (2002).
39. E. Illenberger, H. Baumgärtel, and S. Süzer, J. Electron. Spectrosc. Relat. Phenom. 33, 123 (1984).
40. A. N. Goyette, J. de Urquijo, Y. Wang, L. G. Christophorou, and J. K. Olthoff, J. Chem. Phys. 114, 8932 (2001).
41. M. Bobeldijk, W. Zande, and P. J. Kistemaker, Chem. Phys. 179, 125 (1994).
42. H. Deutsch, K. Becker, S. Matt, and T. D. Märk, Int. J. Mass Spectrom. 197, 37 (2000).
43. W. M. Huo, V. Tarnovsky, and K. H. Becker, Chem. Phys. Lett. 358, 328 (2002).
44. M. T. Lee, L. M. Brescansin, L. E. Machado, and F. Machado, Phys. Rev. A 66, 012720 (2002).
45. L. A. Morgan, J. Tennyson, and C. J. Gillan, Comput. Phys. Commun. 114, 120 (1998).
46. N. Sanna and F. A. Gianturco, Comput. Phys. Commun. 114, 142 (1998).
47. T. L. Porter, D. E. Mann, and N. Acquista, J. Mol. Spectrosc. 16, 228 (1965).
48. B. S. Jursic, Theor. Chem. Acc. 99, 289 (1998).
49. R. B. Diniz, M. Lima, and F. J. Paixão, J. Phys. B: At. Opt. Mol. Phys. 32, L539 (1999).
50. K. L. Baluja, N. J. Mason, L. A. Morgan, and J. Tennyson, J. Phys. B: At. Opt. Mol. Phys. 34, 4041 (2001).
51. R. N. Franklin and J. Snell, J. Phys. D: Appl. Phys. 33, 1990 (2000).
52. R. N. Franklin, J. Phys. D: Appl. Phys. 35, 536 (2002).
53. E. Stoffels, W. W. Stoffels, and K. Tachibana, J. Vac. Sci. Technol. A 16, 87 (1998).
54. L. Beu and P. T. Brown, Semiconductor Fabtech, 11th ed., 91 (2000).
55. P. Chabert, H. Abada, J.-P. Booth, and M. A. Lieberman, J. Appl. Phys. 94, 76 (2003).
56. P. Chabert, G. Cunge, J.-P. Booth, and J. Perrin, Appl. Phys. Lett. 79, 916 (2001).