Electron interactions with C2F6

Journal of Physical and Chemical Reference Data

Volumn 27, Issue 1, 1998, Pages 1-28

  Christophorou, L G ^a   Olthoff, J K ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

C2F6; Cross sections; Electron attachment; Electron collisions; Electron transport; Hexafluoroethane; Ionization; Perfluoroethane; Scattering

Indexed keywords

DIFFUSION; DISSOCIATION; ELECTRON ENERGY LEVELS; ELECTRON SCATTERING; ELECTRON TRANSPORT PROPERTIES; ETCHING; IONIZATION; IONIZATION OF GASES; KINETIC ENERGY; MOMENTUM TRANSFER; PLASMA APPLICATIONS; RATE CONSTANTS; SCATTERING; SEMICONDUCTOR DEVICE MANUFACTURE;

C2F6; CROSS SECTIONS; ELECTRON ATTACHMENT; ELECTRON COLLISION; ELECTRON TRANSPORT; HEXAFLUOROETHANE; PERFLUOROETHANE;

IMPACT IONIZATION;

EID: 0039447975     PISSN: 00472689     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.556016     Document Type: Article

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