A review of focused ion beam technology and its applications in transmission electron microscopy

Journal of Electron Microscopy

Volumn 53, Issue 5, 2004, Pages 527-536

  Sugiyama, Masaaki ^a   Sigesato, Genichi ^a  

^a NIPPON STEEL CORPORATION   (Japan)

Author keywords

Artifact; Focused ion beam; in situ observation; Material; Sample preparation; Transmission electron microscopy

Indexed keywords

GALLIUM;

ARTIFACT; LABORATORY DIAGNOSIS; METHODOLOGY; REVIEW; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

ARTIFACTS; GALLIUM; MICROSCOPY, ELECTRON, SCANNING; MICROSCOPY, ELECTRON, TRANSMISSION; SPECIMEN HANDLING;

ENERGY DISPERSIVE SPECTROSCOPY; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; IONS; SCANNING ELECTRON MICROSCOPY;

ARTIFACT; FOCUSED ION BEAM TECHNOLOGY; FOCUSED IONS BEAMS; IN-SITU OBSERVATIONS; ITS APPLICATIONS; MICROSAMPLING; SAMPLE PREPARATION; SAMPLE PREPARATION TECHNIQUES; TECHNOLOGY APPLICATION; TRANSMISSION ELECTRON MICROSCOPY OBSERVATION;

FOCUSED ION BEAMS;

EID: 13444302969     PISSN: 00220744     EISSN: None     Source Type: Journal    
DOI: 10.1093/jmicro/dfh071     Document Type: Review

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