A plasma-polymerized protective film for transmission electron microscopy specimen preparation by focused ion beam etching

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 3, 1998, Pages 1127-1130

  Kato, N I ^a   Miura, N ^a   Tsutsui, N ^a  

^a IBM JAPAN LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001563140     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581245     Document Type: Article

References (11)

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