Strain analysis in MEMS/NEMS structures and devices by using focused ion beam system

Sensors and Actuators, A: Physical

Volumn 111, Issue 1, 2004, Pages 57-62

  Li, Biao ^a   Tang, Xiaosong ^b   Xie, Huimin ^c   Zhang, Xin ^a  

^a BOSTON UNIVERSITY   (United States)

^b INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

^c TSINGHUA UNIVERSITY   (China)

Author keywords

Focused ion beam; Mass gauge; Moir ; Strain

Indexed keywords

DIFFRACTION GRATINGS; ETCHING; ION BEAMS; MACHINING; MASKS; MICROSTRUCTURE; RESIDUAL STRESSES; STRAIN;

FOCUSED ION BEAMS (FIB); NANO-MACHINING;

MICROELECTROMECHANICAL DEVICES;

EID: 0442311890     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2003.07.014     Document Type: Conference Paper

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