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Volumn 42, Issue 4, 2001, Pages 1613-1619

Focused ion beam/lift-out transmission electron microscopy cross sections of block copolymer films ordered on silicon substrates

(11) White, H a Pu, Y a Rafailovich, M a Sokolov, J a King, A H b Giannuzzi, L A c Urbanik Shannon, C c Kempshall, B W c Eisenberg, A d Schwarz, S A e Strzhemechny, Y M e

a Stony Brook University (United States)

b PURDUE UNIVERSITY (United States)

c University of Central Florida (United States)

d MCGILL UNIVERSITY (Canada)

e CITY UNIVERSITY OF NEW YORK (United States)

Author keywords

Block copolymer; Focus ion beam lift out; Transmission electron microscopy

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; FOCUSING; INTERFACES (MATERIALS); ION BEAMS; PHASE TRANSITIONS; PLASTIC FILMS; POLYSTYRENES; SECONDARY ION MASS SPECTROMETRY; SUBSTRATES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

FOCUSED ION BEAM (FIB) LIFT-OUT METHOD;

BLOCK COPOLYMERS;

COPOLYMER; SILICON;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMICAL STRUCTURE; MASS SPECTROMETRY; PHYSICAL CHEMISTRY; STRUCTURE ANALYSIS; TRANSMISSION ELECTRON MICROSCOPY;

EID: 0034138308 PISSN: 00323861 EISSN: None Source Type: Journal
DOI: 10.1016/S0032-3861(00)00503-6 Document Type: Article

Times cited : (51)

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