Focused ion beam system for TEM sample preparation

Hitachi Review

Volumn 45, Issue 1, 1996, Pages 19-24

  Ishitani, Tohru ^a   Yaguchi, Toshie ^b   Koike, Hidemi ^a  

^a HITACHI LTD   (Japan)

^b Hitachi Instrum Eng Co Ltd

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0037847716     PISSN: 0018277X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (7)

1. N. Nikawa, "Applications of Focused Ion Beam Technique to Failure Analysis of Very Large Scale Integrations: Review," J. Vac. Sci. Technol. B 9 (1991) pp. 2566-2577.
2. F. A. Steve et al., "Applications of Focused Ion Beams in Microelectronics Production, Design and Development," Surf. Interface Anal. 23 (1995) pp. 61-68.
3. T. Ishitani et al., "Transmission Electron Microscope Sample Preparation Using a Focused Ion Beam," J. Electron Microsc. 43 (1994) pp. 322-326.
4. T. Ishitani et al., "Focused-Ion-Beam Digging of Biological Specimens," J. Electron Microsc. 44 (1995) pp. 110-114.
5. T. Ishitani and Y. Kawanami, "Coarse Guidelines in Designing Focused Ion Beam Optics," J. Vac. Sci. Technol. B 13 (1995) pp. 371-374.
6. T. Ishitani, "Monte Carlo Simulation of Ion Bombardment at Low Glancing Angles," Jpn. J. Appl. Phys. 34 (1995) pp. 3303-3306.
7. T. Ishitani and Y. Kaga, "Calculation of Local Temperature Rise in Focused-Ion-Beam Sample Preparation," J. Electron Microsc. 44 (December 1995) pp. 331-336.