Transmission electron microscope sample shape optimization for energy dispersive X-ray spectroscopy using the focused ion beam technique

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 1, 1998, Pages 355-359

  Saito, Masakazu ^a   Aoyama, Takashi ^a   Hashimoto, Takahito ^a   Isakozawa, Shigeto ^a  

^a HITACHI LTD   (Japan)

Author keywords

Energy dispersive X ray spectroscopy; FIB; TEM; ULSI

Indexed keywords

ELECTRON SCATTERING; ION BEAMS; SEMICONDUCTING SILICON; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; ULSI CIRCUITS;

ENERGY DISPERSIVE X RAY SPECTROSCOPY; FOCUSED ION BEAM TECHNIQUE;

X RAY SPECTROSCOPY;

EID: 0031647413     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.37.355     Document Type: Article

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