A comparison of the pattern transfer of line-space patterns from graphoepitaxial and chemoepitaxial block co-polymer directed self-assembly

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 9054, Issue , 2014, Pages

  Millward, Dan B ^a   Lugani, Gurpreet S ^a   Khurana, Ranjan ^a   Light, Scott L ^a   Niroomand, Ardavan ^a   Hustad, Philip D ^b   Trefonas, Peter ^b   Chang, Shih Wei ^b   Lee, Christopher N ^b   Quach, Dung ^b  

^a MICRON TECHNOLOGY INC   (United States)

^b Dow Electronic Materials   (United States)

Author keywords

Chemoepitaxy; Directed self assembly; Graphoepitaxy; LWR; Pattern transfer; SWR

Indexed keywords

EXTREME ULTRAVIOLET LITHOGRAPHY;

CHEMOEPITAXY; DIRECTED SELF-ASSEMBLY; GRAPHOEPITAXY; LWR; PATTERN TRANSFERS; SWR;

SELF ASSEMBLY;

EID: 84901761081     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.2045580     Document Type: Conference Paper

References (14)

1. Liu, C.-C.; Han, E.; Onses, M. S.; Thode, C. J.; Ji, S.; Gopalan, P.; Nealey, P. F., "Fabrication of Lithographically Defined Chemically Patterned Polymer Brushes and Mats", Macromolecules 2011, 44 (7), 1876-1885.
2. Rathsack, B., Somervell, M., Hooge, J., Muramatsu, M., Tanouchi, K., Kitano, T., Nishimura, E., Yatsuda, K., Nagahara, S., Hiroyuki, I., Akai, K., Hayakawa, T., "Pattern scaling with directed self assembly through lithography and etch process integration", Proc. SPIE, 832, Alternative Lithographic Technologies IV, 2012, 83230B
3. Personal correspondence with Roel Gronheid, IMEC.
4. Delgadillo, P.R., Suri, M., Durant, S., Cross, A., Nagaswami, V.R., Van Den Heuvel, D., Gronheid, R., Nealey, P., "Defect source analysis of directed self-assembly process", J. Micro/Nanolith., MEMS MOEMs, 12(3), 031112, (2013)
5. Delgadillo, P.R., Harukawa, R., Suri, M., Durant, S., Cross, A., Nagaswami, V.R., Van Den Heuvel, D., Gronheid, R., Nealey, P., "Defect source analysis of directed self-assembly process (DSA of DSA)", Proc SPIE 8680, Alternative Lithographic Technologies V, 2013, 86800L
6. Liu, G., Thomas, C.S., Craig, G.S.W., Nealey, P.F., "Integration of density multiplication in the formation of deviceoriented structures by directed self-assembly of block copolymer-homopolymer blends", Adv. Funct. Mater., 20, 1251-1257 (2010)
7. Doerk, G. S.; Liu, C.-C.; Cheng, J. Y.; Rettner, C. T.; Pitera, J. W.; Krupp, L.; Topuria, T.; Arellano, N.; Sanders, D. P. "Measurement of placement error between self-assembled polymer patterns and guiding chemical prepatterns." Proc. SPIE 8323, Alternative Lithographic Technologies IV, 2012, 83230P
8. Chang, S.-W.; Evans, J. P.; Ge, S.; Ginzburg, V. V.; Kramer, J. W.; Landes, B.; Lee, C.; Meyers, G.; Murray, D. J.; Park, J.; Sharma,R.; Trefonas III, P.; Weinhold, J. D.; Zhang, J.; Hustad, P. D. "New Materials and Processes for Directed Self-Assembly." Proc. SPIE 8680, Alternative Lithographic Technologies V, 2013, 86800F
9. Jung, Y. S.; Ross, C. A., Nano Letters 2007, 7 (7), 2046-2050
10. Jung, Y. S.; Chang, J. B.; Verploegen, E.; Berggren, K. K.; Ross, C. A., Nano Letters 2010, 10 (3), 1000-1005
11. Chang, S.-W.; Vogel, E. E.; Ginzburg, V. V.; Murray, D. J.; Kramer, J. W.; Weinhold, J. D.; Chuang, V. P. W.; Sharma,R.; Evans, J. P.; Landes, B.; Ge, S.; Trefonas III, P.; Hustad, P. D. "Designing new materials and processes for directed self-assembly applications." Proc. SPIE 8323, Alternative Lithographic Technologies IV, 2012, 83231M.
12. The Flory-Huggins parameter is a dimensionless value that defines the driving force for phase separation of two fluids. It predicts the propensity for the domains of a block co-polymer to phase separate during an anneal process. http://en.wikipedia.org/wiki/Flory%E2%80%93Huggins-solution-theory. P.J. Flory "Thermodynamics of High Polymer Solutions", J. Chem. Phys. 1941, 9(8), 660.
13. J.N.L. Albert, T.H. Epps III, "Self-assembly of block copolymer thin films", Materials Today 2010, 13(6), 24-33
14. M. Darnon, T. Chevolleau, O. Joubert, S. Maitrejean, J. C. Barbe, J. Torres, "Undulation of sub-100nm porous dielectric structures: A mechanical analysis", Applied Physics Letters, 91, 194103, (2007