Simple and versatile methods to integrate directed self-assembly with optical lithography using a polarity-switched photoresist

ACS Nano

Volumn 4, Issue 8, 2010, Pages 4815-4823

  Cheng, Joy Y ^a   Sanders, Daniel P ^a   Truong, Hoa D ^a   Harrer, Stefan ^b,c   Friz, Alexander ^a   Holmes, Steven ^b   Colburn, Matthew ^b   Hinsberg, William D ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

^b IBM   (United States)

^c IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

Block copolymer; Chemical epitaxy; Directed self assembly; Graphoepitaxy; Photoresist

Indexed keywords

BLOCK COPOLYMER SELF-ASSEMBLY; CHEMICALLY AMPLIFIED PHOTORESIST; DIRECTED SELF-ASSEMBLY; FULLY COMPATIBLE; GRAPHOEPITAXY; INTEGRATION SCHEME; NOVEL STRATEGIES; OPTICAL LITHOGRAPHY; PHOTORESIST MATERIALS; POSITIVE TONE; PRE-PATTERNS; SELF ASSEMBLED STRUCTURES; THERMAL PROPERTIES; VERSATILE METHODS; WATER IMMERSION LITHOGRAPHY;

BLOCK COPOLYMERS; COPOLYMERIZATION; EPITAXIAL GROWTH; LITHOGRAPHY; SELF ASSEMBLY; SURFACE TREATMENT; THERMODYNAMIC PROPERTIES;

PHOTORESISTS;

EID: 78650104650     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn100686v     Document Type: Article

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