Advanced cleaning of nano-imprint lithography template in patterned media applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7823, Issue PART 1, 2010, Pages

  Singh, Sherjang ^a   Chen, Ssuwei ^a   Dress, Peter ^b   Kurataka, Nobuo ^c   Gauzner, Gene ^c   Dietze, Uwe ^a  

^a HamaTech USA Inc   (United States)

^b HamaTech APE GmbH   (Germany)

^c SEAGATE TECHNOLOGY   (United States)

Author keywords

Contamination; Defect removal; Feature damage; Nanoimprint; NIL; Patterned media; Template cleaning

Indexed keywords

FEATURE DAMAGE; NANO-IMPRINT; NIL; PATTERNED MEDIAS; TEMPLATE CLEANING;

DEFECTS; DISKS (MACHINE COMPONENTS); DISKS (STRUCTURAL COMPONENTS); FLIGHT DYNAMICS; MAGNETIC STORAGE; NANOIMPRINT LITHOGRAPHY; PHOTOMASKS; QUARTZ; TEMPERATURE CONTROL; ULTRAVIOLET RADIATION;

CLEANING;

EID: 78649891868     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.864298     Document Type: Conference Paper

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