Bit patterned media optimization at 1 Tdot/in2 by post-annealing

Journal of Applied Physics

Volumn 116, Issue 12, 2014, Pages

  Hellwig, Olav ^a   Marinero, Ernesto E ^a   Kercher, Dan ^a   Hennen, Tyler ^a   McCallum, Andrew ^a   Dobisz, Elizabeth ^a   Wu, Tsai Wei ^a   Lille, Jeff ^a   Hirano, Toshiki ^a   Ruiz, Ricardo ^a   Grobis, Michael K ^a   Weller, Dieter ^a   Albrecht, Thomas R ^a  

^a WESTERN DIGITAL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMERS; CARBON; CHROMIUM ALLOYS; CHROMIUM METALLOGRAPHY; COBALT ALLOYS; COBALT METALLOGRAPHY; COERCIVE FORCE; ETCHING; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; PLATINUM ALLOYS; TERNARY ALLOYS;

BIT-PATTERNED MEDIA; CARBON HARD MASKS; ENERGY FILTERED TRANSMISSION ELECTRON MICROSCOPY; INTRINSIC SWITCHING FIELD DISTRIBUTION (ISFD); PATTERN TRANSFERS; PERPENDICULAR ANISOTROPY; RECORDING LAYERS; VACUUM-ANNEALING;

ANNEALING;

EID: 84907752135     PISSN: 00218979     EISSN: 10897550     Source Type: Journal    
DOI: 10.1063/1.4896667     Document Type: Article

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