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MRS Bulletin

Volumn 39, Issue 4, 2014, Pages 336-341

High-resolution direct-write patterning using focused ion beams

(3) Ocola, Leonidas E a Rue, Chad b Maas, Diederik c

a ARGONNE NATIONAL LABORATORY (United States)

b Thermo Fisher Scientific (United States)

c TNO (Netherlands)

Author keywords

Ga; He; ion beam assisted deposition; ion beam processing; ion implantation; ion solid interactions; lithography (removal); microstructure; nanostructure; Ne; Si

Indexed keywords

EID: 84908673658 PISSN: 08837694 EISSN: None Source Type: Journal
DOI: 10.1557/mrs.2014.56 Document Type: Article

Times cited : (29)

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